2003
DOI: 10.1117/12.483667
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Implementation of Reference Measurement System using CD-AFM

Abstract: International SEMATECH (ISMT) and the National Institute of Standards and Technology (NIST) are working together to improve the traceability of atomic force microscope (AFM) dimensional metrology in semiconductor manufacturing. The rapid pace of technological change in the semiconductor industry makes the timely introduction of relevant standards challenging. As a result, the link between the realization of the SI (Systeme International d'Unites, or International System of Units) unit of length -the meter -and… Show more

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Cited by 25 publications
(37 citation statements)
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References 23 publications
(31 reference statements)
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“…The atomic force microscope used in this study scanned a small tip over the structure topography [5,6]. The CD AFM used a round tip with 120-to 140-nm tip width, 13-to 23-nm overhangs, 250-to 350-nm effective length and 13.5-to 55.7-N/m stiffness.…”
Section: Procedures and Apperatusmentioning
confidence: 99%
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“…The atomic force microscope used in this study scanned a small tip over the structure topography [5,6]. The CD AFM used a round tip with 120-to 140-nm tip width, 13-to 23-nm overhangs, 250-to 350-nm effective length and 13.5-to 55.7-N/m stiffness.…”
Section: Procedures and Apperatusmentioning
confidence: 99%
“…In addition, in order to de-convolve the tip shape from the image, the tip must be scanned across a reference sample a short time before or after the measurement to ensure that no tip degradation has occurred, and this overhead can require 10 minutes per wafer. A typical non-contact AFM with a 2D profile tip has an uncertainty of about 0.7 nm 1-sigma for CD and height, and 0.2 degrees 1-sigma for SWA, with little or no substrate material bias, making AFM very attractive as a reference metrology system [6]. The AFM is used as the reference throughout this paper as it provides independent measure of both CD and profile information and is not dependent on the optical properties of the substrate.…”
Section: Procedures and Apperatusmentioning
confidence: 99%
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“…1,2 Details of the RMS implementation and initial uncertainty budgets are well documented. [3][4][5] A major goal of the RMS project is to continue to reduce the uncertainty of measurements made with the system by using suitable samples with close traceability to the SI meter, and by carefully examining all possible error sources. In this work, we outline steps we have taken to reduce the uncertainty of our height and pitch measurements, and the way the RMS is used to support other metrology equipment.…”
Section: Introductionmentioning
confidence: 99%
“…This tool replaced a prior generation instrument that we had previously implemented as an RMS. 1,2 We performed measurements needed to establish a traceability chain and developed uncertainty budgets for pitch, height, and CD measurements. The concept of a RMS has been previously advocated by others, notably Banke and Archie.…”
Section: Introductionmentioning
confidence: 99%