Two organic light-emitting diodes (OLEDs) using the hole current structures of 2:1 NPB:MoO 3 5 nm/2:1 CBP:MoO 3 5 nm/CBP and 2:1 NPB:MoO 3 10 nm/CBP have been fabricated, where NPB and CBP stand for N,N -bis-(1-naphthl)-diphenyl-1,1 -biphenyl-4,4diamine and 4,4 -N,N -dicarbazole-biphenyl, respectively. Despite that 2:1 CBP:MoO 3 is proven to be more resistive than 2:1 NPB:MoO 3 via comparing the I-V characteristics of the hole-only devices, the former OLED using two p-doped layers shows significantly improved I-V characteristics over the latter one using a single p-doped layer, mostly because the whole barrier height for hole transport across the 2:1 NPB:MoO 3 /2:1 CBP:MoO 3 and 2:1 CBP:MoO 3 /CBP interfaces in the former device is 0.22 eV smaller than that for hole transport across the 2:1 NPB:MoO 3 /CBP interface in the latter device. We provide a simple, effective method to enhance the hole current in OLEDs.