2001
DOI: 10.1039/b007543o
|View full text |Cite
|
Sign up to set email alerts
|

Improved quantitative analysis of hard coatings by radiofrequency glow discharge optical emission spectrometry (rf?GD?OES)

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
36
0

Year Published

2001
2001
2016
2016

Publication Types

Select...
8
1

Relationship

2
7

Authors

Journals

citations
Cited by 52 publications
(36 citation statements)
references
References 19 publications
(22 reference statements)
0
36
0
Order By: Relevance
“…In low discharge optical emission spectrometry (GD-OES) measurements, a dc bias voltage correction as well as a hydrogen correction were applied for most elements present. 46,47 Before performing quantitative depth profiling on the oxide films, anodized TiAlV and TiAlNb reference oxides with known thickness and composition were remeasured for compensation of possible small daily variations in the sputter rate. Best crater shape and plasma starting conditions were found at 700 Pa, 25 W (modulus ¼ 680, phase ¼ 440).…”
Section: Glow Discharge Optical Emission Spectrometrymentioning
confidence: 99%
“…In low discharge optical emission spectrometry (GD-OES) measurements, a dc bias voltage correction as well as a hydrogen correction were applied for most elements present. 46,47 Before performing quantitative depth profiling on the oxide films, anodized TiAlV and TiAlNb reference oxides with known thickness and composition were remeasured for compensation of possible small daily variations in the sputter rate. Best crater shape and plasma starting conditions were found at 700 Pa, 25 W (modulus ¼ 680, phase ¼ 440).…”
Section: Glow Discharge Optical Emission Spectrometrymentioning
confidence: 99%
“…This refers to very quick and stable signals, particularly for H and O. Therefore, no hydrogen [16,17] or any other correction is necessary after the measurement. The hydrogen correction is used by other authors because small amounts of hydrogen in the plasma, either from contamination or by sputtering from the sample, can affect the measured intensities due to a change in the emission yield.…”
Section: Resultsmentioning
confidence: 99%
“…1,2) The merit of the r.f. plasma extended the application of GD-OES to a variety of samples; for instance, surface coating on a non-conductive substrate can be analyzed by using a similar handling for conductive samples, 3,4) which can attract more concern on surface analysis by using GD-OES. This paper suggests an advanced detection method in r.f.…”
Section: Introductionmentioning
confidence: 99%