Improvement of Substrates Properties by Incorporating Titanium Nanoparticles Deposited by DC Diode Sputtering Approach

Abstract

In this work, the synthesis of titanium thin films on two different substrates (glass and n-type Si), with thicknesses of 90 and 145 nm at two different times (5 and 10 min) respectively, have been obtained. The thin films have been successfully deposited on glass and silicon substrates using DC diode sputtering technique. The optical properties of the prepared thin films have been checked out using the optical reflectance spectrum. A significant reduction in surface reflectivity was observed at (10 min) sputtering time. The structural properties of the prepared thin films were studied using X-ray diffraction (XRD) and field-emission scanning electron microscopy (FE-SEM). XRD results confirmed that titanium thin films had a hexagonal structure with preferred orientation on (002). The images of FESEM showed that all the samples had a uniform distribution of granular surface morphology. The grain sizes of the Ti nanostructure were estimated using Scherrers' analysis. The thickness of Ti thin film increased as the sputtering time increased for both glass and Si n-type substrates. The repeated experiments revealed that the most uniform Ti thin film is on Si substrate (n-type) with particle size 10 nm at deposition time 5 min.

Effect of Precursor Concentration on the Structural, Optical, and Electrical Properties of WO3 Thin Films Prepared by Spray Pyrolysis

“…As shown in the table, the value of TC of the films made at ideal concentrations equals one (1). This suggests that tungsten oxide coatings develop preferentially [4,39].…”

“…Equations ( 10), (11), and ( 12) were used to determine microstrain(ε), the density of dislocation (δ), and stacking fault (SF) [38]. Microstrain, dislocation density, and stacking fault all decreased with diffraction angle, indicating a reduction in lattice defects at the interplanar spacing of the crystal [39,40]. Table 2 shows the results.…”