Indium
tin oxide (ITO) thin films were sputtered on the plain and
textured glass substrates using direct current (DC) and radio frequency
(RF) magnetron sputtering and then subjected to annealing. The optical
lithography process was adopted to give texture to the glass substrates
with an array of microcuboids with ∼40 μm × ∼40
μm sides out of crosslinked negative photoresists SU-8 2000.5
and SU-8 2005 to obtain cuboid heights of ∼0.5 and ∼5
μm, respectively. The synergistic influences of the deposition
technique, postdeposition annealing, and the use of textured substrates
on the structural, optical, and electrical properties of the films
were investigated using optical microscopy, scanning electron microscopy
(SEM), optical profilometry, and X-ray diffraction (XRD) analyses.
In addition to transmittance analysis using UV–vis spectroscopy,
angle-dependent specular reflectance measurements and COMSOL simulations
have been done to correlate the observed improved transmittance in
ITO films grown on textured substrates. The ITO thin films deposited
by DC and RF sputtering were polycrystalline with (222) and (400)
orientations, respectively. The enhanced capability of accommodation
of oxygen vacancies in (400)-oriented films led to better structural
and electrical properties in RF-sputtered samples. Annealing has resulted
in improved crystallinity and reduction in lattice distortion that
account for a higher transmittance of ∼87.02% in the 350 nm
to 1200 nm wavelength region and lowered electrical resistivity in
both the annealed DC- and RF-sputtered samples. It is also observed
that the transmittance improved due to the influence of underlying
SU-8 periodical textures, with no undesired drastic changes to the
electrical properties.