2014
DOI: 10.1088/1742-6596/564/1/012007
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Impulse Plasma In Surface Engineering - a review

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Cited by 12 publications
(9 citation statements)
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“…It was expected that the differences in plasma composition and energy delivered to the sample will allow to modify the properties of obtained thin films. It should expand the PMS technique and create a wider range of materials by the means different from impulse plasma deposition (IPD) or high-power impulse magnetron sputtering (HIPIMS) [7].…”
Section: Introductionmentioning
confidence: 99%
“…It was expected that the differences in plasma composition and energy delivered to the sample will allow to modify the properties of obtained thin films. It should expand the PMS technique and create a wider range of materials by the means different from impulse plasma deposition (IPD) or high-power impulse magnetron sputtering (HIPIMS) [7].…”
Section: Introductionmentioning
confidence: 99%
“…Vapor phase depositions are successfully used as promising tools for the coverage of nanostructure surfaces with functional coatings and the modification of the corresponding physical and chemical surface properties . In general, chemical vapor deposition (CVD) and physical vapor deposition (PVD) methods allow for the growth of continuous uniform layers of several class of materials, i.e.…”
Section: Coatings Of Zno Nanostructure Surfaces With Continuous Functmentioning
confidence: 99%
“…The Ti (grade 1) target was used and the deposition was conducted in Ar and in a Ar+O 2 (1:4) mixture correspondingly for production of Ti and TiO 2 layers. According to the GIMS technology [2,7,12,17] the working gas was periodically injected with a controlled frequency of an order of 10 Hz to the interelectrode space by a set of pulse bistable valves maintaining the pressure in the range of an order of 10 −3 to 10 −1 Pa. The magnetron was permanently supplied by a DPS supplier working at a power of 24 kW in the unipolar PMS mode at a base frequency of 100 kHz with 2 kHz modulation.…”
Section: Coatings Deposition Technologymentioning
confidence: 99%
“…The idea of the process is as follows [2]: while the electrodes are permanently polarized, the discharge (for example the glow discharge in case of magnetron sputtering) could be cyclically initiated and then vanished accordingly with the pressure pulses with a given frequency. As the pressure fluctuations in the threshold range, * E-mail: zdunek@inmat.pw.edu.pl taking place in the interelectrode space, have in such conditions extremely dynamic oscillatory character, an average value of the pressure at which the glow discharge exists is much lower than at the standard conditions especially during the continuous gas flow described well by the Pashen curve.…”
Section: Introductionmentioning
confidence: 99%