Novel GIMS technique for deposition of colored Ti/TiO₂ coatings on industrial scale

Abstract

The aim of the present paper has been to verify the effectiveness and usefulness of a novel deposition process named GIMS (Gas Injection Magnetron Sputtering) used for the first time for deposition of Ti/TiO 2 coatings on large area glass substrates covered in the condition of industrial scale production. The Ti/TiO 2 coatings were deposited in an industrial system utilizing a set of linear magnetrons with the length of 2400 mm each for covering the 2000 × 3000 mm glasses. Taking into account the specific course of the GIMS (multipoint gas injection along the magnetron length) and the scale of the industrial facility, the optical coating uniformity was the most important goal to check. The experiments on Ti/TiO 2 coatings deposited by the use of GIMS were conducted on substrates in the form of glass plates located at the key points along the magnetrons and intentionally non-heated during any stage of the process. Measurements of the coatings properties showed that the thickness and optical uniformity of the 150 nm thick coatings deposited by GIMS in the industrial facility (the thickness differences on the large plates with 2000 mm width did not exceed 20 nm) is fully acceptable form the point of view of expected applications e.g. for architectural glazing.

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

“…Before the next pulse of the gas, the pressure is lower than normal, which reduces the number of collisions and energy loss of the particles directed to the substrate [12][13][14][15]. Recently, there has also been some interest in a new modification of the sputtering method called gas impulse magnetron sputtering (GI MS) [16][17][18][19]. In the case of this method, fast changes in working gas pressure lead to the thermal unequilibrium of plasma.…”

Raman Measurements as a Fast and Efficient Technique for Characterisation of TiO2 and Quantum Dots on TiO2 Substrate for Photovoltaic Application

“…In this work we used FTO layer since it is widely available on the market, cheap, and has good conductive parameters. The surface resistance was found to be less than 8 Ω/cm 2 [2,9]. On the top of the FTO layer the TiO 2 layer was made using physical vapor deposition (PVD)technique.…”

White paper on the future of plasma science for optics and glass

“…Developments in the field of smart windows/smart glass (photovoltaics, EC, self‐cleaning glass) indicate that smart glass technology is becoming a differentiator in the otherwise highly competitive and commoditized glass industry, thus opening up room for more advanced magnetron sputtering applications . For example, novel reactive magnetron deposition processes such as gas injection magnetron sputtering (GIMS) have been used for the first time for the deposition of Ti/TiO 2 coatings on large area glass substrates, and are under development for the conditions of industrial scale production.…”