2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2017
DOI: 10.1109/asmc.2017.7969255
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In-line metrology for characterization and control of extreme wafer thinning of bonded wafers

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Cited by 5 publications
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“…1,2) As for advanced packaging technologies such as three-dimensional stacked ICs (3DS-ICs), [3][4][5][6][7] multichip modules (MCMs), [8][9][10][11] and fan-out wafer level packages (FOWLPs), [12][13][14][15] the base silicon of ICs tends to be highly thinned for greater form factor. 16) In such advanced packages, the reduced heat conductance of thin silicon increases thermal resistance which prevents heat dissipation. This heat accumulation in thinned LSIs leads to a steeper thermal gradient than in full-thickness LSIs, as shown in Fig.…”
Section: Introductionmentioning
confidence: 99%
“…1,2) As for advanced packaging technologies such as three-dimensional stacked ICs (3DS-ICs), [3][4][5][6][7] multichip modules (MCMs), [8][9][10][11] and fan-out wafer level packages (FOWLPs), [12][13][14][15] the base silicon of ICs tends to be highly thinned for greater form factor. 16) In such advanced packages, the reduced heat conductance of thin silicon increases thermal resistance which prevents heat dissipation. This heat accumulation in thinned LSIs leads to a steeper thermal gradient than in full-thickness LSIs, as shown in Fig.…”
Section: Introductionmentioning
confidence: 99%