of device junctions such as metal oxide semiconductor (MOS) p-and n-channel, tunneling p-or n-junction, and Schottky junction, etc., can be crafted and fabricated separately. In the post-silicon era, newgeneration van der Waals materials such as two-dimensional (2D) semiconductors have received extensive attention and research due to their practical advantages of smooth surface, [1,2] high mobility, [3] ultrathin, [4] flexibility, [5,6] in-plane structural and optical anisotropy, [7][8][9][10] thickness-dependent carrier conduction, [11] thickness tunable bandgap, [12,13] and abundance of direct band-edge excitons. [14,15] Among them, transition metal dichalcogenides (TMDs), including four popular members, MoS 2 , MoSe 2 , WS 2 , and WSe 2 , have been vigorously studied and have potential capabilities in practical semiconductor device applications such as field-effect transistors, [16] bipolar junction transistors, [17,18] phototransistors, [19] and light-emitting diodes (LEDs), [20] etc., due to their high environmental stability and the flexibility on thickness tuning bandgaps. The growth of p-and n-type materials in TMDs layers may be a key issue for the development of various p-n junction devices in 2D semiconductor technology. However, to date, the synthesis of p-type layered TMDs is still challenging, and even some proposals have been made related to Nbdoped p-MoSe 2 , [21] Nb-doped p-MoS 2 , [22] oxygen plasma doped p-MoS 2 , [23] and nitrogen-induced p-WS 2 , [24] etc., the information on the ideal dopants for forming p-type TMDs with controllable carrier concentration and good stability is still insufficient and needs to be further explored. Nowadays, many TMD bipolar p-n junction devices and LEDs typically operate in gate-controlled p-and n-type with a lateral junction, [20,25,26] and a large number of vertically stacked 2D layered devices are still fabricated as heterostructures and heterojunctions [17,18] because of the lack of van der Waals stacked p-n homojunction.Compared to conventional MoS 2 , MoSe 2 , WS 2 , and WSe 2 dichalcogenides, rhenium diselenide (ReSe 2 ) is also an important member of the TMD-family 2D semiconductors, which crystallizes in a specific distorted CdI 2 -type layered structure of triclinic symmetry (space group P1). [27,28] Dissimilar to that the MoS 2 group has a uniform and isotropic layer plane in generally two-layer hexagonal or three-layer rhombohedral form, the structural distortion in the CdI 2 -type (i.e., 1T′) ReSe 2 layer may cause by a specific d 3 nonbonding Re-Re interaction and which The formation of p-or n-type material via impurity doping should be crucial and essentially prior to the establishment of junction devices in semiconductor processing. Especially in a 2D transition-metal dichalcogenide (TMD), dopant selection for growing p-and n-type TMD semiconductors may suffer much higher difficulty and complexity than conventional Si and III-V compounds owing to the complicated valences occurred in transition metals. Different amount of chromium doped in ReSe ...