Incorporation of active Fe impurities in GaInP by high temperature ion implantation

The authors investigated the electrical compensation induced by deep levels introduced in metal organic vapor phase epitaxy grown n+-InGaP∕GaAs epitaxial layers by high temperature Fe implantation. The activation of the Fe2+-related deep levels has been assessed by current-voltage analyses performed at different temperatures. In the framework of the space charge limited current model, they determined the energy location in the gap of the deep levels that control the electrical properties of the semi-insulating epilayers. A donor level which acts as an electron trap located at EC−0.5eV and a Fe-related acceptor level which is responsible for the stable increase of resistivity located at EV+0.72eV were identified.

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Incorporation of active Fe impurities in GaInP by high temperature ion implantation

Cited by 4 publications

References 8 publications

Local structure of Fe incorporated in GaInP layers by high temperature ion implantation

Local structure of Fe incorporated in GaInP layers by high temperature ion implantation

Electrical and structural characterization of Fe implanted GaInP

Deep levels controlling the electrical properties of Fe-implanted GaInP∕GaAs

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