Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge

Jacobsohn, L.G.; Afanasyev-Charkin, I.V.; Cooke, D. W.; Schulze, R.; Averitt, R. D.; Nastasi, M.

doi:10.1116/1.1764820

Cited by 5 publications

(6 citation statements)

References 43 publications

(39 reference statements)

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“…These values are also in line with literature values [22,46]. However, the highly fluorine-doped films have shown fragile mechanical behavior as they were easily scratched, showing incompatible mechanical properties for nanoimprint.…”

Section: Mold Materials Developmentsupporting

confidence: 91%

“…Fluorinated SiC hardness is lower than what was expected for comparable fluorine content, but consistent with a previously measured decrease of hardness with fluorine doping concentration. A decrease from 15 to 10 GPa was also reported in [46] with a fluorine content increasing from 0% to 18%.…”

Section: Mold Materials Developmentmentioning

confidence: 53%

“…This trend is consistent with previous observations [51], where it was shown that fluorinated amorphous silicon carbide films tend to absorb oxygen when exposed to ambient air. It seems therefore that fluorination makes those films more prompt to quick surface oxidation, leading to higher surface energies due to the hydrophilic presence of oxygen counterbalancing the expected hydrophobic effect of fluorine, even though another study showed no incidence of fluorine content on the water contact angle [46].…”

Section: Mold Materials Developmentmentioning

confidence: 98%

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Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates

Bossard¹,

Boussey²,

Drogoff³

et al. 2016

Nanotechnology

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Nanoimprint templates made of diamond-like carbon (DLC) and amorphous silicon carbide (SiC) thin films and fluorine-doped associated materials, i.e. F-DLC and F-SiC were investigated in the context of thermal nanoimprint lithography (NIL) with respect to their release properties. Their performances in terms of durability and stability were evaluated and compared to those of conventional silicon or silica molds coated with antisticking molecules applied as a self-assembled monolayer. Plasma-enhanced chemical vapor deposition parameters were firstly tuned to optimize mechanical and structural properties of the DLC and SiC thin films. The impact of the amount of fluorine dopant on the deposited thin films properties was then analyzed. A comparative analysis of DLC, F-DLC as well as SiC and F-SiC molds was then carried out over multiple imprints, performed into poly (methyl methacrylate) (PMMA) thermo-plastic resist. The release properties of un-patterned films were evaluated by the measurement of demolding energies and surface energies, associated with a systematic analysis of the mold surface contamination. These analyses showed that the developed materials behave as intrinsically easy-demolding and contamination-free molds over series of up to 40 imprints. To our knowledge, it is the first time that such a large number of imprints has been considered within an exhaustive comparative study of materials for NIL. Finally, the developed materials went through standard e-beam lithography and plasma etching processes to obtain nanoscale-patterned templates. The replicas of those patterned molds, imprinted into PMMA, were shown to be of high fidelity and good stability after several imprints.

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Section: Mold Materials Developmentsupporting

confidence: 91%

Section: Mold Materials Developmentmentioning

confidence: 53%

Section: Mold Materials Developmentmentioning

confidence: 98%

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Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates

Bossard¹,

Boussey²,

Drogoff³

et al. 2016

Nanotechnology

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“…Plasma immersion ion processing (PIIP) synthesis is a powerful and versatile way to obtain such coatings. Since synthesis occurs under conditions far from thermodynamic equilibrium, unique materials can be obtained this way, in particular, Si-based materials [1][2][3].…”

Section: Introductionmentioning

confidence: 99%

Chemical bonding investigation of amorphous hydrogenated Si–N alloys deposited by plasma immersion ion processing

et al. 2006

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“…In addition to film quality improvement, thinner QW films have higher light emitting efficiency for SiC and GaAs due to the quantum size effect [7,10]. Fluorine is used to saturate dangling bonds by ion implantation [11], but this influence has not yet been performed on nanostructured SiC to study PL. The dielectric layer of QW luminescence is important for the reflection and transmission properties but the effect of PL has yet to be reported.…”

Section: Introductionmentioning

confidence: 99%

Blue Shifting of Hydrogenated Silicon Carbide Multiple Quantum Wells

Chang

Chen

Kuo

2011

KEM

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Five-period hydrogenated silicon carbide (SiC) multiple quantum wells with silicon dioxide (SiO2) or silicon nitride (SiN) dielectric that were synthesized by high density plasma chemical vapor deposition were studied using photoluminescence (PL) spectroscopy to understand its blue shift. Rapid thermal annealing induced significant blue shifting in the PL spectra after fluorine ion implantation due to crystallization. The thinning of the SiC causes blue shift due to the quantum confinement effect. The higher PL intensity of the amorphous SiC:H in SiO2 than in SiC/SiN may be attributed to the high number of non-radiative sites on its surface. Annealing with nitrogen may cause impurities in SiC/SiO2, thereby broadening the PL peak.

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Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge

Abstract: Effects of microwave power on the structural and emission properties of hydrogenated amorphous silicon carbide deposited by electron cyclotron resonance chemical vapor deposition

Cited by 5 publications

References 43 publications

Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates

Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates

Chemical bonding investigation of amorphous hydrogenated Si–N alloys deposited by plasma immersion ion processing

Blue Shifting of Hydrogenated Silicon Carbide Multiple Quantum Wells

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