2008
DOI: 10.1002/jbm.b.31160
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Increasing cell adhesion on plasma deposited fluorocarbon coatings by changing the surface topography

Abstract: In designing new biomaterials, it is of outstanding importance to consider how cells respond to specific chemical and topographical features on the material surface. The behavior of most cell types in vivo is strictly related to specific chemical and topographical cues that characterize the extra cellular environment. In particular, during their lives cells react to topographical patterns such as those of the extracellular matrix (ECM), of micro and/or nanometric dimensions. The production of micrometric and/o… Show more

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Cited by 69 publications
(52 citation statements)
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“…It should also be noted that nanotexturing permits control of cell growth on the surface as recently discussed in several reports (64,65) …”
Section: Polymeric and Silicon Microfluidic Fabrication And Modificationmentioning
confidence: 90%
“…It should also be noted that nanotexturing permits control of cell growth on the surface as recently discussed in several reports (64,65) …”
Section: Polymeric and Silicon Microfluidic Fabrication And Modificationmentioning
confidence: 90%
“…For example, it affects wetting and optical properties of surfaces, [4,5] the adsorption of proteins on surfaces, [6,7] and the cell adhesion and growth. [8,9] The importance of roughness motivated several studies on plasma induced surface roughness of polymeric substrates; [10][11][12][13][14][15][16][17][18][19][20] the focus was on recipes eliminating or producing roughness and on the mechanisms of roughness creation and evolution.…”
Section: Introductionmentioning
confidence: 99%
“…Generally, the goal of plasma deposition processes fed with fluorocarbons is to deposit films with composition and properties similar, or in some cases superior, to those of PTFE, in order to make them useful in several technological fields, [4] and so fluorocarbon coatings find applications in the manufacturing of textiles, paper, biomaterials, and microelectronic devices. [5][6][7][8][9] To assess how similar to Teflon 1 plasma deposited fluorocarbon coatings are in terms of their chemical/physical characteristics, a parameter named ''Teflon 1 character'' is generally estimated from X-ray photoelectron spectroscopy (XPS), namely the F/C ratio. This is assumed to measure the Teflon 1 character along with the relative amount of the CF 2 moieties in the structure of the coatings: the closer the F/C ratio is to 2, the more Teflon 1 -like the composition, (CF 2 ) n , and the crystalline structure approaches that of Teflon…”
Section: Introductionmentioning
confidence: 99%