2015
DOI: 10.1039/c5ta06846k
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Increasing efficiency of hierarchical nanostructured heterojunction solar cells to 16.3% via controlling interface recombination

Abstract: With a system of interface engineering treatment, heterojunction solar cells fabricated with hierarchical nanostructures exhibit an efficiency of 16.3% using cost-effective as-cut Czochralski n-type silicon substrates.

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Cited by 14 publications
(7 citation statements)
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“…In this sense, excellent surface passivation for the Si nanoarrays is one of the critical issues to obtain superior device performance. To suppress the surface recombination, several thin films including Al 2 O 3 , hydrogenated amorphous silicon (a‐Si:H), and TiO 2 have been deposited on the Si nanostructures to passivate the surface dangling bonds. However, due to the high aspect ratio of the Si nanoarrays, preparation of the passivation layer by post‐deposition methods is difficult to ensure the conformal growth of the films from the top to bottom of the nanostructures.…”
Section: Introductionmentioning
confidence: 99%
“…In this sense, excellent surface passivation for the Si nanoarrays is one of the critical issues to obtain superior device performance. To suppress the surface recombination, several thin films including Al 2 O 3 , hydrogenated amorphous silicon (a‐Si:H), and TiO 2 have been deposited on the Si nanostructures to passivate the surface dangling bonds. However, due to the high aspect ratio of the Si nanoarrays, preparation of the passivation layer by post‐deposition methods is difficult to ensure the conformal growth of the films from the top to bottom of the nanostructures.…”
Section: Introductionmentioning
confidence: 99%
“…Integrating Si nanostructures with Si microstructures, forming a so-called 'multi-scale texture' or 'hierarchical structure', is expected to have an antireflection effect from both Si nanostructures and microstructures [49][50][51][52]. Figure 4(a) shows an example of the hierarchical structures.…”
Section: Quasi-omnidirectional Antireflection Performancementioning
confidence: 99%
“…Plasma enhanced chemical vapor deposition (PECVD), a mature thin lm deposition technology widely used in commercial industry, is commonly adopted to deposit silicon thin lms. Reported V oc and conversion efficiency of RJ-HET solar cells continuously improved and exceeded RJ-HOMO solar cells 14,15 in a short time. However, interface and growth layers have to experience ion bombardment during PECVD process, thus surface damage is unavoidable.…”
Section: Introductionmentioning
confidence: 99%