2006 IEEE 4th World Conference on Photovoltaic Energy Conference 2006
DOI: 10.1109/wcpec.2006.279322
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Increasing the Efficiency of Screen-Printed Silicon Solar Cells by Light-Induced Silver Plating

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Cited by 66 publications
(45 citation statements)
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“…The first layer is printed in an aerosol jet system by Optomec #7 and the second layer is processed by light induced plating. 8 During plating in a cyanide plating bath approximately 10 mm of silver has grown on the fired seed layer resulting in a line width of about 50 mm and a contact height of about 10 mm. A cross section of such a contact structure is depicted in Figure 3.…”
Section: Front Contact Formationmentioning
confidence: 99%
See 1 more Smart Citation
“…The first layer is printed in an aerosol jet system by Optomec #7 and the second layer is processed by light induced plating. 8 During plating in a cyanide plating bath approximately 10 mm of silver has grown on the fired seed layer resulting in a line width of about 50 mm and a contact height of about 10 mm. A cross section of such a contact structure is depicted in Figure 3.…”
Section: Front Contact Formationmentioning
confidence: 99%
“…After firing of this seed layer, the second metal layer is electrochemically plated e.g., by light induced plating (LIP). 8 In this paper, we combine the advantage of an optimized rear side with the benefit of an industrially feasible two-step front side metallization and achieving an average efficiency of 20% over seven cells on one wafer. Neither the formation of a selective emitter nor the opening on a dielectric layer is necessary.…”
Section: Introductionmentioning
confidence: 99%
“…9 In this paper, a novel metal aerosol jet printing technique is introduced to create the seed layer. This technique is different to the ink jet set up, 5 which are used for metallization 10,11 and structuring. 12 The line width can be close to that of photolithographically defined lines of evaporated metals, whereas material exploitation is significantly increased and process complexity is reduced by the direct-write technology.…”
Section: Seed Layer and Platingmentioning
confidence: 99%
“…5 This implies the great advantage that both layers can be optimized individually. If the line width of the first layer is sufficiently narrow, excellent aspect ratios of 1:2 to 1:3 can be achieved.…”
Section: Introductionmentioning
confidence: 99%
“…In order to improve electrical properties of the front electrode, various fabrication techniques are being analyzed (Figure 1), consisting in different imprint techniques and its final connection with the substrate surface. This paper summarizes recent testing with metallization in the front using a conventional Screen Printing The screen printing method used during printing of silver paste on the front surface of silicon wafer [3]- [6]- [7].…”
Section: Introductionmentioning
confidence: 99%