2011
DOI: 10.1016/j.jallcom.2011.03.036
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Influence of annealing on the structural and optical properties of ZnO films grown by MOCVD

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Cited by 25 publications
(15 citation statements)
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“…[1] Currently, in the quest for materials involving charge and spin degrees of freedom of electrons in a single substance, since the theoretical calculations predicted that ZnO doped with transition metals (TMs, e.g. Mn, Co, Fe, Ni, etc.)…”
Section: Introductionmentioning
confidence: 99%
“…[1] Currently, in the quest for materials involving charge and spin degrees of freedom of electrons in a single substance, since the theoretical calculations predicted that ZnO doped with transition metals (TMs, e.g. Mn, Co, Fe, Ni, etc.)…”
Section: Introductionmentioning
confidence: 99%
“…ZnO thin films can be deposited on different substrates using many kinds of techniques including chemical vapor deposition, spray pyrolysis, electrodeposition, pulsed laser deposition and DC and RF magnetron sputtering [8][9][10][11][12][13][14][15][16]. For instance, Bacaksiz et al [9] have formed ZnO thin films using zinc chloride, zinc acetate and zinc nitrate precursors by spray pyrolysis technique on glass substrates and determined their structural and optical properties by X-ray diffraction (XRD), scanning electron microscope (SEM) and optical transmittance spectra.…”
Section: Introductionmentioning
confidence: 99%
“…Undoped ZnO is usually n-type conductive, which is associated with the presence of native point defects (e.g., oxygen vacancies (V O ) and interstitial zinc (Zn i )) [4] or hydrogen impurities [5], but the fabrication of stable and reproducible p-type ZnO has been difficult due to the self-compensation and low solubility of acceptor dopants. In recent years, several groups have reported the growth of p-type ZnO by doping group V elements N [6,7], P [8], As [9] and Sb [10]. Among the group V elements, nitrogen has been regarded as the most suitable dopant for p-type ZnO due to its similar atomic radius to that of oxygen.…”
Section: Introductionmentioning
confidence: 99%