been significantly optimized via control of their nanostructure. Preparation of nanostructured WO 3 thin films is one of important research interests. There are various methods to fabricate nanostructured WO 3 thin films, including spray pyrolysis, [5] sol-gel, [6] chemical vapor deposition method, [7] and physical vapor deposition method. [8] However, the nanosize, distribution, and orientation of the tungsten oxide thin films prepared by the above methods are random and irregular, resulting in poor reproducibility of electrochromic properties, which is not suitable for practical application in "smart windows." Glancing angle magnetron sputtering deposition technology can realize precise control of the morphology, size, and density of nanostructured WO 3 thin films through adjusting and optimizing deposition parameters. [9,10] In this paper, nanostructured tungsten trioxide thin films were deposited by glancing angle reactive magnetron sputtering. The effects of nanostructures on the electrochromic properties and optical properties of WO 3 thin films were compared with those of dense film deposited by conventional magnetron sputtering.