2012
DOI: 10.1016/j.jnoncrysol.2011.11.023
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Influence of the amorphous/crystalline silicon heterostructure properties on planar conductance measurements

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Cited by 5 publications
(10 citation statements)
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“…The surface conductances for the films grown on crystalline silicon substrates correspond to increasing i-layer thickness (0, 4, and 10 min of deposition at a nominal deposition rate of 1 nm/min). As expected from studies on RF PECVD a-Si:H films [10][11][12], the samples on crystalline silicon have a much higher conductance and a weaker temperature dependence, i.e. a lower activation energy (see Table 2), which suggests the presence of a strong inverted layer at the interface.…”
Section: Results and Analysissupporting
confidence: 66%
See 1 more Smart Citation
“…The surface conductances for the films grown on crystalline silicon substrates correspond to increasing i-layer thickness (0, 4, and 10 min of deposition at a nominal deposition rate of 1 nm/min). As expected from studies on RF PECVD a-Si:H films [10][11][12], the samples on crystalline silicon have a much higher conductance and a weaker temperature dependence, i.e. a lower activation energy (see Table 2), which suggests the presence of a strong inverted layer at the interface.…”
Section: Results and Analysissupporting
confidence: 66%
“…We also see that for the same doping concentration on glass, increased film thickness results in higher conductivity with no significant change in activation energy. From Table 2 we note that for samples on glass, [11]. However the samples on crystalline silicon do not follow the expected trend as doping concentration increases; instead the intermediate doped sample shows a higher conductance than the highest doped sample.…”
Section: Results and Analysismentioning
confidence: 85%
“…14,15 Until now, the inversion layer has been considered only as a tool to characterize the band offsets at the a-Si:H/c-Si interface 16,17 and its influence on lateral transport in operating devices has not yet been analyzed. Lateral transport through an inversion layer is successfully leveraged in modulationdoped field-effect transistors 18 and in metal-insulatorconductor inversion layer solar cells.…”
Section: Introductionmentioning
confidence: 99%
“…This lead us to an estimate of Δ E C = 0.15 ± 0.04 eV . A deeper analysis where the influence of other a‐Si:H parameters (position of the Fermi level, density of states at the Fermi level, characteristic temperature of the band tail) was taken into account, together with additional experimental data, which resulted in a slightly larger estimate of Δ E C = 0.18 ± 0.05 eV . The effect of interface states was also considered.…”
Section: Determination Of Band Diagrams At Silicon Heterojunctionsmentioning
confidence: 99%
“…The effect of interface states was also considered. It was shown that they could only have a significant impact on the band bending for values of the interface states density larger than 10 12 cm −2 …”
Section: Determination Of Band Diagrams At Silicon Heterojunctionsmentioning
confidence: 99%