1996
DOI: 10.1109/16.543017
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Infrared focal plane array incorporating silicon IC process compatible bolometer

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Cited by 135 publications
(52 citation statements)
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“…Growing microstructures of foreign materials on top of silicon results in processing complexities that can compromise CMOS compatibility 18,19 . Furthermore, integration of thermally absorbing materials can be effective for short-wavelength infrared response but results in slow pixel response times intrinsically limited by the thermal time constant, which hinders applications in array-based real-time imaging systems at room temperature 10 .…”
mentioning
confidence: 99%
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“…Growing microstructures of foreign materials on top of silicon results in processing complexities that can compromise CMOS compatibility 18,19 . Furthermore, integration of thermally absorbing materials can be effective for short-wavelength infrared response but results in slow pixel response times intrinsically limited by the thermal time constant, which hinders applications in array-based real-time imaging systems at room temperature 10 .…”
mentioning
confidence: 99%
“…Siliconbased detectors satisfy the low-cost and on-chip complementary metal-oxide semiconductor (CMOS) compatibility criteria, but their infrared photoresponse is fundamentally limited by the 1.12-eV band gap (l ¼ 1,110 nm). Previous attempts to extend the photoresponse of silicon-based devices into the short-wavelength infrared regime (l ¼ 1,400-3,000 nm) at room temperature focused on forming heterostructures with SiGe alloys [6][7][8] or microstructures of thermally absorbing material 9,10 , and modifying the intrinsic band structure via intentional introduction of defects [11][12][13][14][15][16][17] . Growing microstructures of foreign materials on top of silicon results in processing complexities that can compromise CMOS compatibility 18,19 .…”
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confidence: 99%
“…Materials that can be processed at CMOS-compatible temperatures include metals and amorphous silicon. However, even though the use of these materials as MEMS structural materials has been demonstrated [31][32][33][34][35][36], they are not ideal candidates due to the performance and reliability problems they might cause. For example, certain metals, like Al, exhibit a tendency to creep, which might result in reliability problems and degraded performance in devices such as pressure sensors or RF switches [37].…”
Section: Cmos-mems Integration: Why How and What?mentioning
confidence: 96%
“…The Laboratoire InfraRouge (LIR) of the Laboratoire dÕElectronique et des Technologies de lÕInformation (LETI) [2] and Raytheon [3] reported the use of doped amorphous Si:H for the same purpose. Metals were investigated for the same application by NEC [4]. Many workers investigated polycrystalline semiconductors, including poly SiGe [5] and polysilicon [6].…”
Section: Introductionmentioning
confidence: 99%