Porous 4H-SiC layers were prepared from monocrystalline samples applying photo-electrochemical etching in hydrofluoric acid. The influence of both current and voltage controlled mode during photo-electrochemical porosification was investigated. It was found that the resulting degree of porosity, the homogeneity in porosity as well as the pore morphology mainly depend on the applied voltage, whereas the current level has an almost negligible impact on these important parameters. Based on these results, it is proposed that the formation of porous SiC during photo-electrochemical etching can be described by fractal growth. Finally the gathered knowledge allowed to detach the porous 4H-SiC layers, which comprised several sub-layers of alternating degree of porosity, from the 4H-SiC substrate. Such layers of tailored porosity are key components for several advanced device concepts such as optical filters or membranes for biological applications. A common method to prepare porous Si is electrochemical etching in HF based solutions.1 There are numerous application scenarios of porous Si, such as electrode material in super-capacitors, 2 as sacrificial layer in the production of MEMS devices 3 or as optical filters in bio-or vapor-sensors. 4,5 In the last application scenario, a stacked layer of porous silicon is electrochemically etched into a silicon wafer. The individual porous layers of the stack show alternating degrees of porosity and thus have a different index of refraction. This results in a wavelength selective reflection of optical light.6 Undoubtedly, porous Si is a well-established material for future micro-or nanomachined device architectures, but it shows a poor chemical stability when exposed to e.g. air at higher temperatures or alkaline electrolytes. 7,8 Therefore it has to be covered with a dense protective layer when operation in harsh or biological environments is targeted.9 This drawback encourages research devoted to other porous materials that can be used instead of porous Si without a surface protection. A promising candidate is porous SiC prepared from single crystalline wafers because it shows a higher chemical stability than silicon.10 In contrast to electrochemical etching of Si, photo-electrochemical etching (PECE) of SiC in HF based etching solutions is a comparably challenging task and hence, only a limited number of publications exist.11,12 Some authors report a skin layer on top of the porous structure, which exhibits only a few pores with diameters in the nm range.13,14 This skin layer is followed by a cap layer which shows an irregular porous structure. 15 This problem has been addressed recently by a combination of metal assisted photochemical etching with PECE. 16 Metal assisted photochemical etching (MAPCE) can be utilized to generate a layer in the μm range prior to PECE. The pore tips of this porous layer provide initiation sites for PECE. Thus, neither a skin nor a cap layer are observed.Furthermore some authors report about an increased porosity at the bottom of the porous laye...