2004
DOI: 10.1049/el:20040458
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InGaP/InGaAs PHEMT with high IP3 for low noise applications

Abstract: A low noise InGaP=InGaAs pseudomorphic high-electron-mobility transistor (PHEMT) with high IP3 was developed. The device utilises InGaP as the Schottky layer to achieve a low noise figure and uses AlGaAs as the spacer to reform the electron mobility and contains dual delta doped layers to improve the device linearity.

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Cited by 10 publications
(2 citation statements)
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“…The designed circuit was fabricated using an in-house-developed standard pHEMT process, the details of which were included in our previous publications. 23,24) Table I lists the key process parameters for the device and passive components. Note that the parameters for the device were extracted from the measurement results of a 2 © 50 µm test device with the same gate width.…”
mentioning
confidence: 99%
“…The designed circuit was fabricated using an in-house-developed standard pHEMT process, the details of which were included in our previous publications. 23,24) Table I lists the key process parameters for the device and passive components. Note that the parameters for the device were extracted from the measurement results of a 2 © 50 µm test device with the same gate width.…”
mentioning
confidence: 99%
“…4,5) The double -doped InGaP/AlGaAs/InGaAs PHEMTs was designed to further enhance the Hall mobility as compared to the InGaP/ InGaAs PHEMTs. 6) In this paper, the InGaP/AlGaAs/ InGaAs E-mode PHEMTs with double -doped of two different doping concentrations were fabricated and characterized, these two doping concentrations were desinged for achieving high efficiency and high linearity operating at low voltage supply.…”
mentioning
confidence: 99%