2002
DOI: 10.1016/s0038-1101(02)00102-8
|View full text |Cite
|
Sign up to set email alerts
|

InP/In0.53Ga0.47As/InP double heterojunction bipolar transistors on GaAs substrates using InP metamorphic buffer layer

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
7
0

Year Published

2003
2003
2024
2024

Publication Types

Select...
4
3

Relationship

0
7

Authors

Journals

citations
Cited by 15 publications
(7 citation statements)
references
References 7 publications
0
7
0
Order By: Relevance
“…The metamorphic HEMT devices using the graded buffer have demonstrated good performance and have been applied in the circuit applications [10,11]. Recently, the metamorphic HBTs using graded buffer layers have also been studied [12,13]. However, the low thermal conductivity of the conventional graded buffer layers, such as InAlAs, InGaP or AlGaAsSb, results in the substantial increase of junction temperature and degradation of device performance [13][14][15].…”
Section: Article In Pressmentioning
confidence: 99%
See 1 more Smart Citation
“…The metamorphic HEMT devices using the graded buffer have demonstrated good performance and have been applied in the circuit applications [10,11]. Recently, the metamorphic HBTs using graded buffer layers have also been studied [12,13]. However, the low thermal conductivity of the conventional graded buffer layers, such as InAlAs, InGaP or AlGaAsSb, results in the substantial increase of junction temperature and degradation of device performance [13][14][15].…”
Section: Article In Pressmentioning
confidence: 99%
“…Recently, the metamorphic HBTs using graded buffer layers have also been studied [12,13]. However, the low thermal conductivity of the conventional graded buffer layers, such as InAlAs, InGaP or AlGaAsSb, results in the substantial increase of junction temperature and degradation of device performance [13][14][15]. In this case, the InP buffer layer is preferred for the metamorphic HBT applications as its thermal conductivity is very high.…”
Section: Article In Pressmentioning
confidence: 99%
“…Recently, due to the progressive requirements, the scaling down consideration and fabrication of deep submicron meter devices have become key roles in modern IC industry [1], [2]. In the ULSI's technologies, polysilicon and diffused resistors are widely used throughout the semiconductor industry for a variety of applications especially in a CMOS process [3]…”
Section: Temperature-dependent Characteristics Of Polysilicon and Difmentioning
confidence: 99%
“…subcollector. We have found that AlGaAsSb and InAlAs metamorphic buffer layers have very low effective thermal conductivities [2], and have earlier reported MDHBTs with higher thermal conductivity InP buffer layers [3], [4]. AlGaAsSb and InAlAs buffers have low effective thermal conductivities because they are alloy materials.…”
Section: Introductionmentioning
confidence: 99%
“…Although the use of lower indium composition may ease the material growth, it [12,13]. Many technical issues need to be addressed in terms of both growth and fabrication technologies before these devices can be considered for utilization in commercial systems.…”
Section: Chapter 1 Introductionmentioning
confidence: 99%