Insights into “near-frictionless carbon films”

Johnson, Jacqueline A.; Woodford, John; Chen, Xidong; Andersson, Joakim; Erdemir, Ali; Fenske, G.R.

doi:10.1063/1.1739287

Cited by 43 publications

(39 citation statements)

References 18 publications

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“…For the 50/50 gas ratio in the plasma, we can note that hydrogen and deuterium are incorporated in the layer with a constant ratio D/H of 0.20. This is in good agreement with other works [17]. H+D content decreases linearly from 31 to 23 at.%.…”

Section: Hydrogen and Deuterium Rate Determinationsupporting

confidence: 94%

Deuterated Diamond Like Carbon films (DDLC): Mechanical properties in relation with microstructure

Mathis

Meunier

Guibert³

et al. 2008

Surface and Coatings Technology

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Section: Hydrogen and Deuterium Rate Determinationsupporting

confidence: 94%

Deuterated Diamond Like Carbon films (DDLC): Mechanical properties in relation with microstructure

Mathis

Meunier

Guibert³

et al. 2008

Surface and Coatings Technology

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“…Earlier hydrogen forward scattering studies on NFC films suggested that hydrogen concentrations range from 38 to 40 at.% [20]. We feel that such a high hydrogen concentration is primarily responsible for the superlow friction of these films beyond the initial or break-in friction regimes during sliding tests.…”

Section: Resultsmentioning

confidence: 64%

“…Specifically, they are synthesized in gas discharge plasmas that typically consist of ten hydrogen atoms per carbon atom. Under such deposition conditions, the resultant films contain higherthan-normal hydrogen concentrations (38-40 at.%) [20]. Most of the hydrogen atoms are paired with r-bonds of carbon atoms, but some unbonded or free hydrogen may also be present in the bulk, and they are accommodated as interstitials [2].…”

Section: Resultsmentioning

confidence: 99%

Investigation of Initial and Steady-State Sliding Behavior of a Nearly Frictionless Carbon Film by Imaging 2- and 3-D TOF-SIMS

Eryilmaz

Erdemir

2007

Tribol Lett

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Using imaging time-of-flight secondary ion mass spectrometry (TOF-SIMS), we investigated the initial and steady-state sliding behavior of a nearly frictionless carbon (NFC) film. Specifically, TOF-SIMS images (both 2-D and 3-D) of these surfaces were constructed to highlight the spatial distributions of ionized and molecular species that were present on as-received and friction-tested NFC surfaces and as a function of depth. As a complementary technique, we used X-ray photoelectron spectroscopy (XPS) to gain further insight into the chemical nature of the sliding surfaces. The NFC films were produced on Si wafers and steel substrates in a gas discharge plasma that consisted of 25 vol.% methane and 75 vol.% hydrogen using a plasmaenhanced chemical vapor deposition (PECVD) system. They were then subjected to sliding friction and wear experiments in a pin-on-disk machine under 5-and 10-N loads and at sliding velocities of 0.2-0.5 m/s in dry nitrogen. The initial friction coefficients of the NFC films were in the range of 0.05-0.1, but decreased rapidly to values less than 0.01 at steady state. Positive and negative TOF-SIMS spectra and 2-and 3-D images reconstructed from selected masses revealed that the elemental distribution of certain chemical species differs substantially between undisturbed and tribo-tested areas of the NFC films. Specifically, the tribo-tested areas are essentially made up of carbon and hydrogen, while undisturbed or as-received areas are covered by a layer that is rich in oxygen and other species. These findings correlate well with the initial and steady-state friction coefficients of these films and help further explain their superlubricity in inert test environments.

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“…When it was observed for the first time, the purity of the C 2 D 2 gas used in the experiment was mentioned as one of the possible reasons for the differences revealed by IR spectroscopy [9]. In the last few years many experiments reporting differences in the incorporation of hydrogen and deuterium were published [10,11]. Differences in the deposition rate, smaller for films deposited from CD 4 than CH 4 , keeping fixed all other deposition parameters were also observed [12], indicating that further investigations are still needed.…”

Section: Introductionmentioning

confidence: 99%

Deuterated amorphous carbon films: Film growth and properties

Costa

Freire

2010

Surface and Coatings Technology

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HardnessDeuterated amorphous carbon films (a-C:D) have been studied in the last few years in order to investigated possible isotopic effects in the film properties. When compared with films deposited in methane atmosphere, an important reduction of the deuterium content of the films was observed and the reasons for that are not well understood. In this work, we deposited amorphous carbon films by PECVD using methane and deuterated methane gas mixtures as precursor atmospheres. We also investigated the effects of the self-bias voltage. The hydrogen and deuterium content was measured by elastic recoil detection analysis and we observed the preferential incorporation of hydrogen over deuterium. The precursor atmosphere was monitored by mass spectrometry and only small differences can be observed in the obtained mass spectra. The possible reasons for the total hydrogen content are discussed. The film deposition rate, the film microstructure as revealed by Raman spectroscopy, the film hardness determined by nanoindentation and the internal stress are dependent on the precursor atmosphere, however a much stronger dependence on the self-bias voltage was observed for deuterated carbon films.

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Insights into “near-frictionless carbon films”

Cited by 43 publications

References 18 publications

Deuterated Diamond Like Carbon films (DDLC): Mechanical properties in relation with microstructure

Deuterated Diamond Like Carbon films (DDLC): Mechanical properties in relation with microstructure

Investigation of Initial and Steady-State Sliding Behavior of a Nearly Frictionless Carbon Film by Imaging 2- and 3-D TOF-SIMS

Deuterated amorphous carbon films: Film growth and properties

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