Integrated atomic layer deposition and chemical vapor reaction for the preparation of metal organic framework coatings for solid-phase microextraction Arrow

Lan, Hangzhen; Salmi, Leo D.; Rönkkö, Tuukka; Parshintsev, Jevgeni; Jussila, Matti; Hartonen, Kari; Kemell, Marianna; Riekkola, Marja‐Liisa

doi:10.1016/j.aca.2018.04.033

Cited by 50 publications

(23 citation statements)

References 33 publications

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“…[36] Additionally,t his approach could be extended to (and used to compare) other synthesis techniques, [4] like one-pot solvothermal self-assembly, [8] spincoating, [11,37] and the emerging chemical vapor or atomic layer deposition methods. [38][39][40][41]…”

Section: Resultsmentioning

confidence: 99%

In Situ Spectroscopy of Calcium Fluoride Anchored Metal–Organic Framework Thin Films during Gas Sorption

et al. 2020

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Surface-mounted metal-organic frameworks (SUR-MOFs) show promising behavior for am anifold of applications.AsMOF thin films are often unsuitable for conventional characterization techniques,understanding their advantageous properties over their bulk counterparts presents ag reat analytical challenge.Inthis work, we demonstrate that MOFs can be grown on calcium fluoride (CaF 2)w indows after proper functionalization. As CaF 2 is optically (in the IR and UV/Vis range of the spectrum) transparent, this makes it possible to study SURMOFs using conventional spectroscopic tools typically used during catalysis or gas sorption. Hence,wehave measured HKUST-1 during the adsorption of CO and NO.We show that no copper oxide impurities are observed and also confirm that SURMOFs grown by al ayer-by-layer (LbL) approach possess Cu + species in paddlewheel confirmation, but 1.9 times less than in bulk HKUST-1. The developed methodology paves the way for studying the interaction of any adsorbed gases with thin films,n ot limited to MOFs,l ow temperatures,o rt hese specific probe molecules,p ushing the boundaries of our current understanding of functional porous materials.

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Section: Resultsmentioning

confidence: 99%

In Situ Spectroscopy of Calcium Fluoride Anchored Metal–Organic Framework Thin Films during Gas Sorption

et al. 2020

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“…Table ?? includes several representative examples of the reported MOF-based coatings for this SPME geometry together with other configurations [48][49][50][51][61][62][63][64][65][66][67][68][69][70][71][72][73][74][75][76]. The vast majority of reported MOF-based f-SPME devices uses the most common MOFs, such as: HKUST-1-composed of copper nodes and 1,3,5-benzenetricarboxylate struts [61,65,[77][78][79]; UiO-66-formed by the combination of Zr clusters and 1,4-benzenedicarboxylate ligands [62,67,80,81]; MIL-type MOFs, synthesized using 1,4-benzenedicarboxylate ligands and different metal ions, including Cr [68,69,82,83], Fe [84][85][86][87], and Al [66,88]; and MOFs composed of Zn metal centers, including MOF-5 with 1,4-benzenedicarboxylate as ligand [64,[89][90][91][92], and the family of ZIF MOFs containing imidazolate-based ligands...…”

Section: Overwiev On Commercial F-spme Devicesmentioning

confidence: 99%

“…Lan et al [71] proposed a new coating strategy based on atomic layer deposition (ALD) and conversion methods. The entire approach permits the preparation of more selective af-SPME devices coated with different MOFs: the MOF Fe-BDC (composed of Fe metal centers and 1,4-benzenedicarboxylate ligands) was the best for the extraction of benzene-containing polar compounds, while the UiO-66(Zr) coating exhibited better results for polar and aromatic analytes.…”

Section: Mofs In On-arrow-fiber Solid-phase Microextraction (Af-spme)mentioning

confidence: 99%

“…includes several representative examples of the reported MOF-based coatings for this SPME geometry together with other configurations[48][49][50][51][61][62][63][64][65][66][67][68][69][70][71][72][73][74][75][76]. The vast majority of reported MOF-based f-SPME devices uses the most common MOFs, such as: HKUST-1-composed of copper nodes and 1,3,5-benzenetricarboxylate struts[61,65,[77][78][79]; UiO-66-formed by the combination of Zr clusters and 1,4-benzenedicarboxylate ligands…”

mentioning

confidence: 99%

“…(B) Atomic layer deposition and conversion method proposed for the preparation of MOF-based af-SPME devices. Adapted from[71], with permission from Elsevier, 2018.…”

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confidence: 99%

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Metal–Organic Frameworks as Key Materials for Solid-Phase Microextraction Devices—A Review

et al. 2019

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Metal–organic frameworks (MOFs) have attracted recently considerable attention in analytical sample preparation, particularly when used as novel sorbent materials in solid-phase microextraction (SPME). MOFs are highly ordered porous crystalline structures, full of cavities. They are formed by inorganic centers (metal ion atoms or metal clusters) and organic linkers connected by covalent coordination bonds. Depending on the ratio of such precursors and the synthetic conditions, the characteristics of the resulting MOF vary significantly, thus drifting into a countless number of interesting materials with unique properties. Among astonishing features of MOFs, their high chemical and thermal stability, easy tuneability, simple synthesis, and impressive surface area (which is the highest known), are the most attractive characteristics that makes them outstanding materials in SPME. This review offers an overview on the current state of the use of MOFs in different SPME configurations, in all cases covering extraction devices coated with (or incorporating) MOFs, with particular emphases in their preparation.

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Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Multia

Karppinen

2022

Adv Materials Inter

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organic ligands act as bridges between the metal centers to form infinite 1D, 2D, or 3D structures. These materials are often referred to as coordination polymer (CP) [1] or metal-organic framework (MOF) [2] materials; the latter term is used when the metal-organic material is crystalline and highly porous. [3] The research field of CP-and MOF-type materials has grown tremendously over the last two decades. The structural and chemical diversity of these materials has served as a continuous source of scientific excitement; the same diversity has also triggered huge technological interest as these materials possess enormous potential to be tailored for a wide variety of applications ranging from gas capture, storage, and separation to sensing, catalysis, optics, electronics, and energy storage. [4][5][6][7] Most of the targeted application breakthroughs of metal-organics require that these materials can be produced as highquality thin films and coatings, which can be integrated with the other components in the actual device configuration. The possibility to deposit such thin films in an industry-feasible manner on the substrate types needed, would be a major step forward in the field. [8] Traditionally, solvent-based processes such as liquid-phase epitaxy, Langmuir-Blodgett, layer-by-layer, and electrochemical deposition techniques have been used for metal-organic thin films. [9][10][11] These are, however, incompatible with the requirements set by the possible integration of the materials in microelectronics. This is due to corrosion and contamination risks, and the problems in patterning and precise deposition on high-aspect-ratio features. Hence, it is vital to develop solventfree thin-film deposition routes for the metal-organic material family. In the optimal case, these deposition methods should allow conformal coatings on large-area and high-aspect-ratio substrates.The currently strongly emerging ALD/MLD technique is uniquely suited to address the challenge in a scientifically elegant yet industrially feasible way. This technique is derived from the two parent gas-phase thin-film techniques: ALD for inorganic materials (mostly binary metal oxides, sulfides, and nitrides), [12][13][14] and its counterpart MLD for purely organic thin films (e.g., polyimides and polyamides). [15] In both cases, the attractive film growth characteristics are derived from the unique way of separating the different precursor gas pulses. Currently, ALD is the standard thin-film technology in many Atomic layer deposition (ALD) for high-quality conformal inorganic thin films is one of the cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less-exploited counterpart for purely organic thin films. Currently, the hybrid of these two techniques, i.e., ALD/MLD, is strongly emerging as a state-of-the-art gas-phase route for designer's metal-organic thin films, e.g., for the next-generation energy technologies. The ALD/MLD literature comprises nearly 300 original journal papers covering most of the alkali...

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Integrated atomic layer deposition and chemical vapor reaction for the preparation of metal organic framework coatings for solid-phase microextraction Arrow

Cited by 50 publications

References 33 publications

In Situ Spectroscopy of Calcium Fluoride Anchored Metal–Organic Framework Thin Films during Gas Sorption

In Situ Spectroscopy of Calcium Fluoride Anchored Metal–Organic Framework Thin Films during Gas Sorption

Metal–Organic Frameworks as Key Materials for Solid-Phase Microextraction Devices—A Review

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

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