In this paper, we will propose an innovative DFM (Design for Manufacturability) design flow. This flow achieves designs for logic products that are much more manufacturable than those using traditional design flows in nanometer technologies. The proposed DFM design flow is unique because it integrates manufacturability informationextracted directly from the target nanometer process-into the timing-driven synthesis and P&R cost function. As such, the designer is able to easily analyze optimal die size, yield, and performance trade-offs and seamlessly account for them before releasing the design to reticle creation. This proposed design flow system is comprised of three major elements:A DFM extension library, which creates "Yield Strength" variants of the basic logic functions in the library.
0A new design view data-file containing a precharacterized set of design attributes extracted from the cell library layouts and the required target process parameters extractions. A set of sofhare elements that plug the manufacturability information into the standard IC design creation and analysis flow.The EDA tools interact with these elements to determine the most manufacturable mapping and arrangement of any given logic function onto the physical library. The application of the proposed design flow in various 130nm designs will be presented. These will demonstrate the validity of the proposed approach, where DFM trade-offs are made early in a design effort, and will illustrate the practical advantages and implications of this approach in a nanometer design flow.