“…Samples are grown by molecular beam epitaxy using previously described techniques [6,9,10,13]. For all seven samples, the epitaxial layers consist of a GaSb buffer layer, a bottom 100-nm Al(As,Sb) barrier layer, an unintentionally doped and nominally 4-μm-thick T2SL absorber layer, a top 100-nm Al(As,Sb) barrier layer, and a 150-nm In(As,Sb) cap layer.…”