2017
DOI: 10.1021/acsami.7b10407
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Interface Modification of Bernal- and Rhombohedral-Stacked Trilayer-Graphene/Metal Electrode on Resistive Switching of Silver Electrochemical Metallization Cells

Abstract: Bernal- and rhombohedral-stacked trilayer graphene (B- and r-TLG) on nickel (Ni) and iridium (Ir) films acting as bottom electrodes (BEs) of silver electrochemical metallization cells (Ag-EMCs) have been investigated in this study. Prior to the fabrication of the EMC devices, Raman mapping and atomic force microscopy are applied to identify the B- and r-TLG sheets, with the latter revealing a significant D peak and a rough surface for the Ir film. The Ag-EMCs with the stacked BE of r-TLG on the Ir film show a … Show more

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Cited by 4 publications
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“…8(a). The fitting result can be attributed to the barrier height between the Ir TE and GdO x RS layers, which can be extracted as 0.71 eV; however, the barrier height is smaller than the value reported, 30) the reason for which may be because the thickness of the GdO x film is only 12 nm. In the MRS1 and MRS2 regions, with the I-V relationship re-plotted as the current density versus the square of the applied voltage (J-V 2 ), the conductive mechanism of the SCLC is able to be confirmed based on the linear fitting presented in Figs.…”
Section: Multilevel Rs Characteristics Of Gdo X /Sin X Rramsmentioning
confidence: 66%
“…8(a). The fitting result can be attributed to the barrier height between the Ir TE and GdO x RS layers, which can be extracted as 0.71 eV; however, the barrier height is smaller than the value reported, 30) the reason for which may be because the thickness of the GdO x film is only 12 nm. In the MRS1 and MRS2 regions, with the I-V relationship re-plotted as the current density versus the square of the applied voltage (J-V 2 ), the conductive mechanism of the SCLC is able to be confirmed based on the linear fitting presented in Figs.…”
Section: Multilevel Rs Characteristics Of Gdo X /Sin X Rramsmentioning
confidence: 66%