2006
DOI: 10.1103/physrevb.74.014414
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Interlayer coupling mechanisms in amorphousCoxSi1xSimultilayers

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Cited by 11 publications
(21 citation statements)
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“…This Co-Si system has been recently shown to couple antiferromagnetically with switching fields in the order of few oersteds. 22,23 Interestingly, a much stronger AF coupling has been also recently reported in polycrystalline Co/Si multilayers. 24 However, up to now, the evidence of the AF coupling has been based on accepted but indirect measurements such as hysteresis loops.…”
Section: Introductionmentioning
confidence: 71%
See 1 more Smart Citation
“…This Co-Si system has been recently shown to couple antiferromagnetically with switching fields in the order of few oersteds. 22,23 Interestingly, a much stronger AF coupling has been also recently reported in polycrystalline Co/Si multilayers. 24 However, up to now, the evidence of the AF coupling has been based on accepted but indirect measurements such as hysteresis loops.…”
Section: Introductionmentioning
confidence: 71%
“…24 However, up to now, the evidence of the AF coupling has been based on accepted but indirect measurements such as hysteresis loops. [22][23][24] In the following, SXRMS is used to confirm the presence of the AF alignment and investigate the AF configuration. The angle dependent reflectivity curves are first analyzed.…”
Section: Introductionmentioning
confidence: 99%
“…For the single period Co 0.74 Si 0.26 film, the best fit to the out-of-plane H r ͑ ͒ dependence was obtained with an effective anisotropy field H eff Ϸ 0.9 kOe corresponding to M s Ӎ H eff / 4 = 73 G, in good agreement with previous studies. 9,10 On going from a single layer film to a trilayer film ͑n =2͒ with a Si interlayer thickness s = 3 nm, the effective anisotropy field increases by 100 Oe. With increasing Si interlayer thickness at n = 2, the effective anisotropy decreases to the value for a single layer film H eff Ϸ 0.9 kOe at s =24 nm ͑see Fig.…”
Section: Resultsmentioning
confidence: 99%
“…[9][10][11] One characteristic of these magnetic amorphous compounds, besides their well known soft magnetic behavior, is that several properties, such as the saturation magnetization and uniaxial anisotropy, can be tuned by fine adjustment of the alloy composition. In the case of Co x Si 1−x / Si multilayers, the saturation magnetization and the Curie temperature are reduced when the Si content is increased, 10 so that the strength of the usual magnetostatic coupling contributions present in any magnetic multilayer system can be tailored. Moreover, the soft magnetic behavior of these alloys allows the detection of very weak AF coupling which could not be observed in samples based on pure Co magnetic layers.…”
Section: Introductionmentioning
confidence: 99%
“…A clear example of these advantages is the case of Co x Si 1Àx /Si multilayers, where films with in-plane uniaxial magnetic anisotropy and very low coercive fields are obtained when the composition of the magnetic layer corresponds to an amorphous arrangement. This decrease of the coercive field with respect to the polycrystalline films is crucial for the detection and characterization of extremely weak coupling [6][7][8]. While the thickness [6] and temperature dependence [7,8] of this coupling has been previously studied, and the interplay between the different kinds of interactions between the magnetic layers has been recently analyzed [8], this work is focused on the influence of the number of periods of the multilayer in the magnetization reversal process.…”
Section: Introductionmentioning
confidence: 98%