A chemically durable glass containing a large amount of phosphorus is useful for in situ irradiation of can cers. It can be activated to emitter with 14.3d half-life by neutron bombardment. Microspheres of the acti vated glass injected to the tumors can irradiate ray directly to the tumors without giving radiation to neighboring normal tissues. In order to examine possibility for obtaining such a glass by ion implantation, P+ ion was implanted into a pure silica glass in a plate form under 50keV to different doses. This implanta tion energy is estimated to give the maximum concentration of P+ ion at 48.6nm in depth from the surface. Structural damage was produced near the surface of the glass by the ion implantation for all the doses in the range from 51016 to 1101cm-2.The phosphorus was localized only in the regions deeper than 1.2nm from the surface, taking a form of phosphorus colloids, for a dose of 51016cm2, whereas it was distribut ed up to the glass surface and a part of it near the surface was oxidized for doses above 11017cm2. The former glass little released both P and Si into water at 95 even after 7d, whereas the latter glasses released appreciable amounts of these elements. At implantation energy of 20keV, even a dose of 51016 cm-2 formed an oxidized phosphorus at the glass surface and gave appreciable releases of P and Si from the glass into water. This indicates that a chemically durable glass containing a larger amount of phosphorus could be obtained if P+ ion is implanted at higher energies and localized in a deeper region, even if the sur face structure of the glass is damaged by the ion implantation.