2020 IEEE International Reliability Physics Symposium (IRPS) 2020
DOI: 10.1109/irps45951.2020.9129530
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Inverse Design of FinFET SRAM Cells

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Cited by 3 publications
(3 citation statements)
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“…Chen et al (2020) propose a human approach using hill climbing and support vector regression for optimizing silicon on insulator (SOI) lateral power devices (1) . Zhang et al (2020) tackle the issue of wear and tear effects and process variations in FinFET SRAM cells by integrating deep neural networks (DNNs) and evolutionary algorithms (EAs) (2) . Ashai et al (2023) tackle the challenge of extracting parameters for the BSIMCMG semiconductor device model using a deep learning architecture that combines a convolutional neural network (CNN) and GPT-3.5 (3) .…”
Section: Fig 1 Workflow Of the Projectmentioning
confidence: 99%
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“…Chen et al (2020) propose a human approach using hill climbing and support vector regression for optimizing silicon on insulator (SOI) lateral power devices (1) . Zhang et al (2020) tackle the issue of wear and tear effects and process variations in FinFET SRAM cells by integrating deep neural networks (DNNs) and evolutionary algorithms (EAs) (2) . Ashai et al (2023) tackle the challenge of extracting parameters for the BSIMCMG semiconductor device model using a deep learning architecture that combines a convolutional neural network (CNN) and GPT-3.5 (3) .…”
Section: Fig 1 Workflow Of the Projectmentioning
confidence: 99%
“…Our pursuit of advancing transistor design is substantiated through a scrupulous comparative investigation, intricately connecting our research findings with crucial literature in design optimization. By drawing insights from the works of Chen et al (2020) and Zhang et al (2020), who deeply explored silicon on insulator (SOI) lateral power devices and FinFET SRAM cells, respectively, our inverse design model for transistors surpasses traditional limitations. Through the comparison of our results, we not only affirm the effectiveness of our approach but also underline the evolutionary shift towards more efficient and automated processes in transistor design.…”
Section: Comparative Studymentioning
confidence: 99%
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