2020 IEEE 17th India Council International Conference (INDICON) 2020
DOI: 10.1109/indicon49873.2020.9342380
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Investigation of Dual-Material Double Gate Junctionless Accumulation-Mode Cylindrical Gate All Around (DMDG-JLAM-CGAA) MOSFET with High-k Gate Stack for low Power Digital Applications

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Cited by 11 publications
(4 citation statements)
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“…In this MOSFET, the doping of the channel is done moderately lower than the source/drain, providing increased conductivity and better performance than JLT. However, SCEs are not negligible in JAM, so, a dual‐metal with gate stacked 18–20 JAM MOSFET was proposed 21 . Dual‐ Metal gates provide enhanced carrier injection effect, gate transport efficiency and better gate control 22 …”
Section: Introductionmentioning
confidence: 99%
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“…In this MOSFET, the doping of the channel is done moderately lower than the source/drain, providing increased conductivity and better performance than JLT. However, SCEs are not negligible in JAM, so, a dual‐metal with gate stacked 18–20 JAM MOSFET was proposed 21 . Dual‐ Metal gates provide enhanced carrier injection effect, gate transport efficiency and better gate control 22 …”
Section: Introductionmentioning
confidence: 99%
“…However, SCEs are not negligible in JAM, so, a dual-metal with gate stacked [18][19][20] JAM MOSFET was proposed. 21 Dual-Metal gates provide enhanced carrier injection effect, gate transport efficiency and better gate control. 22 All the overhead stated devices have considered channel to be uniformly doped.…”
Section: Introductionmentioning
confidence: 99%
“…JAM MOSFET possesses better electrical characteristics, more conductivity and less SCEs in contrast to JLT. To decrease the SCEs further, double gates and a gate stack [10][11][12] are introduced to JAM MOSFET, proposing a new structure called Dual-Metal Gate Stack (DMGS) JAM-CSG MOSFET [13].…”
Section: Introductionmentioning
confidence: 99%
“…27 An alternative, Junctionless Accumulation Mode FET, offers low source/drain resistance due to higher doping in source/drain regions and improved carrier mobility through reduced channel doping. [28][29][30][31] Junctionless Accumulation Mode FETs offer significant advantages over conventional MOSFETs and TFETs. They simplify fabrication, excel in gate control, enhance scaling potential, reduce junctionrelated defects for improved reliability, and promise lower-voltage operation with reduced leakage.…”
mentioning
confidence: 99%