2015
DOI: 10.1016/j.tsf.2015.07.022
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Investigation of residual stress in structured diamond films grown on silicon

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Cited by 15 publications
(13 citation statements)
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References 26 publications
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“…This is fully consistent with the fact that the TEC of Si becomes higher than that of diamond at T N 510°C (see Fig. 2) [44]. Fig.…”
Section: Absolute Values Of Stresses and Comparison Of Experimental Dsupporting
confidence: 88%
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“…This is fully consistent with the fact that the TEC of Si becomes higher than that of diamond at T N 510°C (see Fig. 2) [44]. Fig.…”
Section: Absolute Values Of Stresses and Comparison Of Experimental Dsupporting
confidence: 88%
“…6b) than for the thicker diamond film GaN/D2 (~0.3 GPa). This effect is related to the elasticity of diamond which partially compensates the stress at the upper corner of the diamond strip [44]. In order to deeper analysis of the influence of the film thickness on the thermally induced stress, additional FEM simulations were performed (see Fig.…”
Section: Methodology Of Stress Evaluation and Relative Values Of Thermentioning
confidence: 99%
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“…The stress appears in CVD process when the samples are cooled down from the deposition temperature to the room temperature. The magnitude of induced stress is affected by deposition conditions and diamond film properties (morphology, thickness) but depends mainly on the mismatch of the thermal and mechanical properties between substrate and diamond film [25,26].…”
Section: Semmentioning
confidence: 99%