“…In contrast to thin Gd 2 O 3 films on GaAs, these films remain stable during annealing and are resistant to exposure of ion beams. Using the technique of secondary electron imaging (SEI), 4 we find that there is a high degree of rotational alignment of crystallographic features at the Gd 2 O 3 /GaN interface, even though there is a lattice mismatch between the film and the substrate.…”