2014
DOI: 10.1088/0268-1242/29/7/075007
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Investigation of the effect of oxygen gas on properties of GAZO thin films fabricated by facing targets sputtering system

Abstract: Gallium and aluminum co-doped ZnO (GAZO) thin films were deposited on glass substrate by using a facing targets sputtering system under various oxygen atmosphere, and the effect of oxygen on their structural, optical and electrical properties was investigated. All as-deposited GAZO thin films under oxygen atmosphere exhibited smooth surface and the lowest value of root-mean-square was 0.6 nm at oxygen 1 sccm, this value is lower than that of film deposited at pure argon atmosphere. The (0 0 2) peak intensity w… Show more

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Cited by 15 publications
(12 citation statements)
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“…Hydrogen microwave plasma annealing can increase the carrier concentration and mobility of GAZO films resulting from producing the shallow hydrogen donors and removing the oxygen adsorbed on the surface of grains similar to reports on AZO films [ 17 - 19 ]. The lowest electrical resistivity of GAZO films reported recently is from 2.18 × 10 −4 to 1.186 × 10 −3 Ω-cm [ 10 - 14 ]. The electrical resistivity of the hydrogen microwave plasma-annealed GAZO films reported in this work is 4.7 × 10 −4 Ω-cm, which is relatively low compared with the lowest electrical resistivity of GAZO films reported recently.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Hydrogen microwave plasma annealing can increase the carrier concentration and mobility of GAZO films resulting from producing the shallow hydrogen donors and removing the oxygen adsorbed on the surface of grains similar to reports on AZO films [ 17 - 19 ]. The lowest electrical resistivity of GAZO films reported recently is from 2.18 × 10 −4 to 1.186 × 10 −3 Ω-cm [ 10 - 14 ]. The electrical resistivity of the hydrogen microwave plasma-annealed GAZO films reported in this work is 4.7 × 10 −4 Ω-cm, which is relatively low compared with the lowest electrical resistivity of GAZO films reported recently.…”
Section: Resultsmentioning
confidence: 99%
“…Gallium and aluminum co-doped zinc oxide (GAZO) films were fabricated these years. Different deposition methods to produce GAZO films such as pulsed laser deposition, co-sputtering, and facing targets sputtering were reported [ 10 - 14 ]. GAZO films were expected to possess the advantages of both GZO and AZO films.…”
Section: Introductionmentioning
confidence: 99%
“…In the case of application in electronic devices, ZnO film depositedb yavacuum process, such as sputtering, is widely used as at ransparent electrode and channel layer owing to high crystallinity, transparency,a nd electrical conductivity. [3][4][5] However,i tr equires high-cost vacuum equipment, and thus, many researchers are focusing on solutionp rocessing as an alternative fabrication method. ZnO film fabricated by solution processing has various kinds of surface morphologies, such as plates, nanobelts, nanorings, and nanocombs.…”
Section: Introductionmentioning
confidence: 99%
“…Transparent conductive oxides (TCO) are widely used in fabricating transparent electrodes of solar cells, touch panel displays, organic light emitting devices, and transparent thin films transistors [1,2]. Tin doped indium oxide (ITO) is the commonly used materials of TCO nowadays due to its excellent electrical and optical properties.…”
Section: Introductionmentioning
confidence: 99%
“…Gallium and aluminum codoped zinc oxide (GAZO) films were fabricated and expected to obtain the benefits of both AZO and GZO films. The GAZO films have been prepared by several deposition methods such as pulsed laser deposition, cosputtering, and facing targets sputtering [2,10,[13][14][15]. Inline sputtering technique is widely used in mass-production system for large-sized substrates.…”
Section: Introductionmentioning
confidence: 99%