Investigation of the surface of poly(ethylene terephthalate) films modified by vacuum ultraviolet irradiation in air

Mitrofanov, A. V.; Karban, O.; Sugonyako, A.V.; Lubomska, Monika

doi:10.1134/s1027451009040065

Cited by 9 publications

(4 citation statements)

References 16 publications

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“…Based on the results of [14], to calculate the average distance D between grains on a flat surface, we use the relation…”

Section: Resultsmentioning

confidence: 99%

Surface Morphology of Y2O3:Eu Thin Films at Different Activator Concentrations

2022

Nanosistemi, Nanomateriali, Nanotehnologii

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Atomic force microscopy is used to study the surface morphology of thin Y 2 O 3 :Eu films obtained by the radio-frequency ion-plasma sputtering with an activator concentration of 1.0, 2.5, and 5 mol.%. Based on the analysis of the obtained results, an almost linear dependence of the sizes of surface structures on the value of the activator concentration and a superlinear increase in both the root-mean-square surface roughness and the average distance between grains are revealed. The obtained results are discussed.Методою атомно-силової мікроскопії (АСМ) досліджено морфологію поверхні тонких плівок Y 2 O 3 :Eu, одержаних методою високочастотного (ВЧ) йонно-плазмового розпорошення, з концентрацією активатора у 1,0, 2,5 та 5 мол.%. На основі аналізи одержаних результатів встановлено практично лінійну залежність розмірів поверхневих структур від величини концентрації активатора та надлінійне зростання середньоквадратичної шерсткости поверхні та середньої віддалі між зернами. Проведено обговорення одержаних результатів.

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“…Based on the results of [14], to calculate the average distance D between grains on a flat surface, we use the relation…”

Section: Resultsmentioning

confidence: 99%

Surface Morphology of Y2O3:Eu Thin Films at Different Activator Concentrations

2022

Nanosistemi, Nanomateriali, Nanotehnologii

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“…breaking bonds in polymers [7,8]. VUV photon fluxes Φ (photons × s −1 ) can attain values comparable to those of particle fluxes; therefore, VUV radiation participates in a broad range of surface interaction processes with positive or negative impact depending on the application [9][10][11]. This fact is increasing interest in the systematic determination of the relative fluxes of ions and photons, as well as of related control parameters in low-pressure inductively coupled plasma (ICP) [12][13][14][15][16].…”

Section: Introductionmentioning

confidence: 99%

In situmeasurement of VUV/UV radiation from low-pressure microwave-produced plasma in Ar/O₂gas mixtures

Iglesias

Mitschker

Fiebrandt

et al. 2017

Meas. Sci. Technol.

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Ultraviolet (UV) and vacuum ultraviolet (VUV) spectral irradiance is determined in low-pressure microwave-produced plasma, which is regularly used for polymer surface treatment. The re-emitted fluorescence in the UV/VIS spectral range from a sodium salicylate layer is measured. This fluorescence is related to VUV/UV radiation in different spectral bands based on cut-off filters. The background produced by direct emitted radiation in the fluorescence spectral region is quantified using a specific background filter, thus enabling the use of the whole fluorescence spectral range. A novel procedure is applied to determine the absolute value of the VUV/UV irradiance on a substrate. For that, an independent measurement of the absolute spectral emissivity of the plasma in the UV is performed. The measured irradiances on a substrate from a 25 Pa Ar/O2-produced plasma are in the range of 1015–1016 These values include the contribution from impurities present in the discharge.

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“…В качестве перспективных материалов для резистов рассматриваются различные полимер-ные композиции на основе полиметилметакри-лата [3,4], политетрафторэтилена [5], полиими-да [6,7], полиэтилентерефталата [8] и других термически и механически стойких полимеров. Особенно важную роль играют диазохинон-но-волачные (ДХН) резисты [9,10].…”

Section: Introductionunclassified

Measurement of Microhardness of Photoresist Films on Silicon by the Scratching Method

Бринкевич¹,

Просолович²,

Янковский³

et al. 2016

Prib. metody izmer.

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Investigation of the surface of poly(ethylene terephthalate) films modified by vacuum ultraviolet irradiation in air

Cited by 9 publications

References 16 publications

Surface Morphology of Y2O3:Eu Thin Films at Different Activator Concentrations

Surface Morphology of Y2O3:Eu Thin Films at Different Activator Concentrations

In situmeasurement of VUV/UV radiation from low-pressure microwave-produced plasma in Ar/O₂gas mixtures

Measurement of Microhardness of Photoresist Films on Silicon by the Scratching Method

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Investigation of the surface of poly(ethylene terephthalate) films modified by vacuum ultraviolet irradiation in air

Cited by 9 publications

References 16 publications

Surface Morphology of Y2O3:Eu Thin Films at Different Activator Concentrations

Surface Morphology of Y2O3:Eu Thin Films at Different Activator Concentrations

In situmeasurement of VUV/UV radiation from low-pressure microwave-produced plasma in Ar/O2gas mixtures

Measurement of Microhardness of Photoresist Films on Silicon by the Scratching Method

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In situmeasurement of VUV/UV radiation from low-pressure microwave-produced plasma in Ar/O₂gas mixtures