1999
DOI: 10.1088/0022-3727/32/15/316
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Investigations of CH4, C2H2and C2H4dusty RF plasmas by means of FTIR absorption spectroscopy and mass spectrometry

Abstract: Infrared (IR) absorption spectroscopy and mass spectrometry have been simultaneously applied to dusty radiofrequency (RF) plasmas in methane, acetylene and ethylene. The combination of IR absorption spectroscopy and mass spectrometry allows the chemical composition and structure of the most relevant plasma-produced neutral species, the ionic plasma composition and the chemical composition of the nanometer-sized particles to be precisely identified. The production of acetylenic compounds (C2Hx) seems to be a ke… Show more

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Cited by 206 publications
(201 citation statements)
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“…Besides these commonly observed species in some literature works [14,15,27,28], a much more abundant of C x H y (in Fig. 7) were recorded in our mass spectra with well resolved mass peaks.…”
Section: Discrepancy Analysissupporting
confidence: 78%
“…Besides these commonly observed species in some literature works [14,15,27,28], a much more abundant of C x H y (in Fig. 7) were recorded in our mass spectra with well resolved mass peaks.…”
Section: Discrepancy Analysissupporting
confidence: 78%
“…According to the spectral pattern of the mass spectrum of the negative ions in an acetylene discharge, the repeated insertion of acetylene molecules results in an anion sequence with anions that peaks at the C 2n H -species (Deschenaux et al, 1999). Therefore, C 2 H -anions can trigger a consecutive chain of polymerization reactions that evolves as follows:…”
Section: Polymerization Reactionsmentioning
confidence: 99%
“…In this last case, the fundamental requirement is the presence of molecular precursors [11]. These precursors result from the presence of reactive gases (silane SiH 4 [5,[12][13][14][15][16], methane CH 4 [17][18][19], acetylene C 2 H 2 [17,20,21]) or from material erosion (physical or chemical) at the molecular level [22][23][24][25][26]. They initiate a complex succession of chemical and physical reactions, leading to the growth of dust particles.…”
Section: Introductionmentioning
confidence: 99%