Ion beam deposition of crystallographically aligned nano-crystalline silicon films

Khan, H.R.; Frey, Hartmut

doi:10.1016/0257-8972(95)02490-5

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Nanoparticle Transparent and Electrically Conducting Zinc Ox1

Introduction1

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2017

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Cited by 4 publications

(2 citation statements)

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“…The ion-beam-deposition (IBD) technique offers many advantages over other techniques. For example, the microstructure, texture epitaxy [85][86][87], and the adhesivity of the deposited films can be controlled by varying the energy of the ions or by ion-assisted IBD from solid targets or gaseous sources. A continuous deposi- tion at lower temperatures on flexible substrates, such as polymers as well as doping the films during deposition, is also possible.…”

Section: Nanoparticle Transparent and Electrically Conducting Zinc Oxmentioning

confidence: 99%

Nanoparticle Films

Khan¹

2015

Handbook of Thin-Film Technology

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Section: Nanoparticle Transparent and Electrically Conducting Zinc Oxmentioning

confidence: 99%

Nanoparticle Films

Khan¹

2015

Handbook of Thin-Film Technology

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“…In general, CVD [1,2] and Plasma Enhanced Chemical Vapour Deposition (PECVD) techniques [1,3,4] are used to deposit polycrystalline and amorphous silicon films, respectively. High quality films of silicon and of other materials can also be deposited using ion beam deposition technique [1,[4][5][6][7][8]. The grain size of the silicon films from nanocrystalline to polycrystalline is modified by annealing in vacuum or inert gas atmospheres or by surface annealing using lasers.…”

Section: Introductionmentioning

confidence: 99%

Deposition of Silicon Films from Liquid Cyclopentasilane Precursors Using High Pressure Spray System

Frey¹,

Lauth²,

Khan³

et al. 2017

PSIJ

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Si-films were deposited from liquid precursors, especially cyclopentasilane using a high pressure spray deposition system based on an electronically controlled piezo-injector in a inert gas atmosphere. This equipment might be applicable to other liquid precursors and targeted thin Sifilms of importance. The thermal properties and reactivity with oxygen of pure liquid cyclopentasilane and its solutions in toluene are investigated by temperature dependent FTIR-Spectroscopy and Differential Scanning Calorimetry. The homogenous films of silicon in µm range thickness are deposited from pure liquid cyclopentasilane and its solutions in toluene on rigid carbon glass plates and on flexible carbon glass fiber substrates using a high pressure spray deposition system. The morphological and structural properties of the silicon films were investigated. These results and the chemical analysis of the films show that the annealed films are Original Research Article

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Ion-beam deposition of nanocrystalline and epitaxial silicon films using silane plasma

Khan

Frey²

1999

Surface and Coatings Technology

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Ion beam deposition of crystallographically aligned nano-crystalline silicon films

Cited by 4 publications

References 13 publications

Nanoparticle Films

Nanoparticle Films

Deposition of Silicon Films from Liquid Cyclopentasilane Precursors Using High Pressure Spray System

Ion-beam deposition of nanocrystalline and epitaxial silicon films using silane plasma

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