2005
DOI: 10.1007/s11664-005-0053-1
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Ion beam mixing of silicon-germanium thin films

Abstract: An overview of processing silicon-germanium (Si-Ge) alloys for various applications is presented here. Several methods of formation are briefly summarized. In particular, results of preliminary experiments on ion-beam mixing of Si-Ge layered structures deposited by physical vapor deposition and subsequently ion implanted with varying doses of argon are presented. Different layered structures have been designed and mixed to obtain optimal process conditions. The ion beam mixing process yields films with a gradu… Show more

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Cited by 9 publications
(15 citation statements)
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“…High‐performance applications in silicon microelectronics include silicon–germanium alloys, which compete with direct band–gap compound semiconductors such as GaAs 1. 2 The introduction of Ge in Si solar cells enhances the efficiency due to a considerably lower band gap 1.…”
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confidence: 99%
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“…High‐performance applications in silicon microelectronics include silicon–germanium alloys, which compete with direct band–gap compound semiconductors such as GaAs 1. 2 The introduction of Ge in Si solar cells enhances the efficiency due to a considerably lower band gap 1.…”
mentioning
confidence: 99%
“…High‐performance applications in silicon microelectronics include silicon–germanium alloys, which compete with direct band–gap compound semiconductors such as GaAs 1. 2 The introduction of Ge in Si solar cells enhances the efficiency due to a considerably lower band gap 1. For fabrication of these Si–Ge structures molecular beam epitaxy, plasma‐enhanced, and metal–organic chemical vapor deposition have been used 29.…”
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confidence: 99%
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“…Examples of well-studied solid-solid interfaces in the literature include Si-SiO 2 16,17 and Ge-Si. 18,19 Recent developments in the bandgap engineering of strained monolayer and bilayer 2D materials 20 make the study of interfaces and films even more interesting and challenging.…”
mentioning
confidence: 99%