1986
DOI: 10.1116/1.573870
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Ion beam sputter deposited zinc telluride films

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Cited by 13 publications
(1 citation statement)
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“…Considering the required technology, these films have also been developed thus far by employing laser evaporation, ion beam sputtering, laser chemical vapor deposition, plasma enhancement, chemical bath deposition, spray pyrolysis, liquid phase screen printing, pulsed laser deposition, spin coating and sol-gel techniques. 147–156 The obtained film parameters are presented in Table 5 for electrodeposition together with the other chemical and physical route-based techniques such as SILAR, PLD and CSS.…”
Section: Deposition Techniquesmentioning
confidence: 99%
“…Considering the required technology, these films have also been developed thus far by employing laser evaporation, ion beam sputtering, laser chemical vapor deposition, plasma enhancement, chemical bath deposition, spray pyrolysis, liquid phase screen printing, pulsed laser deposition, spin coating and sol-gel techniques. 147–156 The obtained film parameters are presented in Table 5 for electrodeposition together with the other chemical and physical route-based techniques such as SILAR, PLD and CSS.…”
Section: Deposition Techniquesmentioning
confidence: 99%