Ion plasma deposition of oxide films with graded-stoichiometry composition: Experiment and simulation

Volpyas, V. A.; Tumarkin, A. V.; Mikhailov, A. K.; Kozyrev, A. B.; Platonov, Roman

doi:10.1134/s1063785016070300

Cited by 10 publications

(4 citation statements)

References 10 publications

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“…Total pressure of the magnetron sputtering system is responsible for evaluating the performance and transport mechanism of sputtering process [48]. This pressure not limited to purity and quality of thin films but also important factor or parameter in transport process of sputtered parameters [49].…”

Section: Optimization Of Total Pressurementioning

confidence: 99%

Fabrication of Mg/Al2O3 Nanolaminates using DC/PDC Magnetron Sputtering to Evaluate the Effect of Oxygen Content and Total Pressure for Deposition of Thin-Films

Deshmukh¹,

Shendokar²,

Sankar³

2023

Global J. Eng. Technol. Adv.

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Thin films have always shown high sensitivity to its deposition parameters and surface morphology. Magnetron sputtering is known for its high level of consistency in deposition and repeatability. In this study Mg/Al2O3 nanolaminates in a range of 10 to 40 nm were synthesized using Direct current and Pulsed DC sputtering techniques at room temperature on glass substrates and silicon substrate using different oxygen flow rates and varying total pressure conditions to understand its effect on deposition rates and roughness of thin films. It is observed that more power and resources consumed for higher deposition time. Roughness of the film is very sensitive for certain applications like corrosion, Lenses, Implants. Scanning electron microscopy (SEM), Atomic force microscopy (AFM) were used to characterize the morphology, structure of the thin films. Optical microscopy and X-ray reflectometry (XRD-XRR) techniques confirmed the optical density and thickness of the nanolaminates respectively. It is confirmed that as total pressure and oxygen flow rate rises deposition rate significantly goes down, that impacts deposition time and roughness of thin films.

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Section: Optimization Of Total Pressurementioning

confidence: 99%

Fabrication of Mg/Al2O3 Nanolaminates using DC/PDC Magnetron Sputtering to Evaluate the Effect of Oxygen Content and Total Pressure for Deposition of Thin-Films

Deshmukh¹,

Shendokar²,

Sankar³

2023

Global J. Eng. Technol. Adv.

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“…Nevertheless, in the latter case, it is possible to vary the composition of the films within certain limits by changing the deposition parameters. Thus, it has been shown that by varying the working gas pressure (in the range of 2-60 Pa) during RF magnetron sputtering of a ceramic target of barium-strontium titanate (Ba 1-x Sr x TiO 3 or BST), it is possible to change the composition within a fairly wide range (x = 0.3 -0.65) (Volpyas et al 2016). The physical reason for this is a change in the length of the thermalization zone.…”

Section: Introductionmentioning

confidence: 99%

“…The physical reason for this is a change in the length of the thermalization zone. In this case, with an increase in the working gas pressure, the ratio of atoms deposited under directional and diffuse sputtering regimes changes (Volpyas, Kozyrev 2011;Volpyas et al 2016).…”

Section: Introductionmentioning

confidence: 99%

Microstructure and properties of polycrystalline PZT films obtained by RF magnetron sputtering with fine variation of the composition near morphotropic phase boundary

Dolgintsev

Kaptelov

Сенкевич

et al. 2021

Physics of Complex Systems

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The article discusses the possibilities of fine composition variation of polycrystalline PZT films at the morphotropic phase boundary. The composition of thin films prepared by RF magnetron sputtering of a ceramic target of stoichiometric composition PbZr 0.54 Ti 0.46 O 3 was varied by changing the distance from the target to the substrate in the range of 30-70 mm. This made it possible to change the composition by ~1.5%. The study focused on the dielectric properties of the formed self-polarized films. The study found that the resistance to external electric fields depends on the conditions of film preparation.

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“…In the present study, we propose a method of ion-plasma deposition onto a substrate that provides an opportunity to fabricate multicomponent films with controlled continuous variation of composition over their thickness using a single target. The method relies on variation of the directional properties of fluxes of sputtered target atoms as a result of their thermalization and transition to a diffusion motion mode, which are induced by changes in the working gas pressure in the process of film growth [10,11].…”

mentioning

confidence: 99%

Ion-plasma deposition of multicomponent films with a given law of composition distribution by thickness

Kozyrev

Volpyas

Tumarkin

et al. 2023

Technical Physics Letters

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A method is proposed for ion-plasma deposition of thin multicomponent films with the ability to control the component composition in thickness (graded film) with a change in the pressure of the working gas according to a given law. Using the BaxSr1-xTiO3 (BSTO)perovskite-type structure as an example, the calculated (Monte Carlo simulation) and experimental dependences of the component composition of films and their deposition rate on the pressure of the working gas were obtained. As an example, the possibility of deposition of BSTO films with a linear distribution of composition by their thickness. Keywords: ion-plasma deposition, thin multicomponent films, composition control.

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Ion plasma deposition of oxide films with graded-stoichiometry composition: Experiment and simulation

Cited by 10 publications

References 10 publications

Fabrication of Mg/Al2O3 Nanolaminates using DC/PDC Magnetron Sputtering to Evaluate the Effect of Oxygen Content and Total Pressure for Deposition of Thin-Films

Fabrication of Mg/Al2O3 Nanolaminates using DC/PDC Magnetron Sputtering to Evaluate the Effect of Oxygen Content and Total Pressure for Deposition of Thin-Films

Microstructure and properties of polycrystalline PZT films obtained by RF magnetron sputtering with fine variation of the composition near morphotropic phase boundary

Ion-plasma deposition of multicomponent films with a given law of composition distribution by thickness

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