Large-area surface-plasmon polariton interference lithography

Guo, Xiaowei; Du, Jinglei; Guo, Yongkang; Yao, Jun

doi:10.1364/ol.31.002613

Cited by 101 publications

(42 citation statements)

References 14 publications

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“…In 2006, Guo et al proposed a large-area surface plasmon polariton interference lithography (LSPPIL) [50]. Figure 6.3 shows the physical arrangement.…”

Section: Prism-coupled Spps Nanolithographymentioning

confidence: 99%

“…Being different from the former SPPs interference lithography [50] which requires a high refractive prism to be used, a low refractive prism could also be used to excite SPPs in the backside-exposure SPPIL device; however, due to the limited transmission distance of SPPs, it can pass through a resist layer only when it is thinner than 100 nm. The resonant condition of surface plasmon and resolution of interference patterns are varied with different thickness of the resist layer.…”

Section: Prism-coupled Spps Nanolithographymentioning

confidence: 99%

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Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Liu

Duan

Peng

2013

Nanostructure Science and Technology

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With the developments of the nanoscale science and technology, the demand for fabrication of nanoscale patterns has been significantly increased. Photolithography has still been the most widely used microfabrication technique because of its ease of repetition, effective cost, and suitability for large-area fabrication. The diffraction limit, however, restricts single-exposure resolution to features with periods no smaller than half wavelength of the illuminating sources. To achieve nanometer feature sizes within the regime of diffraction physics, one straightforward method is to reduce the working wavelength by employing light sources of higher photon energy, such as extreme ultraviolet light (EUV), soft X-rays, or atomic wave packet [1][2][3][4]. The main drawbacks, however, are the drastic increase of complexity and cost for instrumentation and processing, including the developments of new sources, photoresist, and the optical components. Several alternative techniques, such as electron beam lithography [5][6][7][8][9], focused ion beam lithography [10][11][12][13][14], dip-pen lithography [15][16][17][18], and nanoimprint lithography [19][20][21][22], can also achieve nanoscale feature sizes; however, these methods require the introduction of a new infrastructure of tools, materials, and processing technologies, which costs huge expenses.Recently, a new photolithographic scheme, which is based on the unique properties of surface evanescent waves [23][24][25][26] or surface plasmon polaritons (SPPs) [27][28][29][30][31][32][33][34][35][36][37] induced at the interface between a metal and a dielectric material, to achieve sub-diffraction-limit nanopatterns was proposed and demonstrated. The wave vector of SPPs can be significantly larger than that of the free-space illuminating light at the same frequency, which results in extraordinary "optical frequency but X-ray wavelength" property. As a result, the resolution of this surface plasmon nanolithography can go far beyond the free-space diffraction limit of the light. Different versions of the implementation of the SPPs-based super-resolution nanolithography have been proposed and conducted both theoretically and experimentally in recent years, which all demonstrate that SPPs-based nanolithography has the potential to satisfy the requirements of high resolution, low cost, and high throughput simultaneously.

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“…In 2006, Guo et al proposed a large-area surface plasmon polariton interference lithography (LSPPIL) [50]. Figure 6.3 shows the physical arrangement.…”

Section: Prism-coupled Spps Nanolithographymentioning

confidence: 99%

Section: Prism-coupled Spps Nanolithographymentioning

confidence: 99%

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Liu

Duan

Peng

2013

Nanostructure Science and Technology

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“…And it was demonstrated that the finer experimental results are easy to achieve at smaller incident angle [101]. Using this type of lithography system, 1D patterns using two-beam interference and 2D patterns using four-beam interference have been demonstrated [101][102][103][104][105][106][107][108][109][110][111]. The interferential beams are The plasmonic head flying 20 nm above the rotating substrate.…”

Section: Plasmonic Direct Writing Nanolithographymentioning

confidence: 99%

Plasmonic Nanolithography: A Review

Xie

Wang

et al. 2011

Plasmonics

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Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.

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“…Unfortunately, the above plasmonics lithography methods are limited by the small interference areas or a mask grating with a very fine period. To overcome the two disadvantages, Du and coworkers [11] used the prism-metal-resist-substrate structure to realize the large-area maskless SPPs nanolithography. In the method, the two counterpropagating incident beams through the Kretschmann structure excite the counter-propagating SPPs in the interface of the metal and resist, and then the SPPs interference lines occur.…”

Section: Introductionmentioning

confidence: 99%