2020
DOI: 10.1002/adfm.202001688
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Laser‐Assisted Multilevel Non‐Volatile Memory Device Based on 2D van‐der‐Waals Few‐Layer‐ReS2/h‐BN/Graphene Heterostructures

Abstract: Few-layer rhenium disulfide (ReS 2) field-effect transistors with a local floating gate (FG) of monolayer graphene separated by a thin hexagonal boron nitride tunnel layer for application to a non-volatile memory (NVM) device are designed and investigated. FG-NVM devices based on two-dimensional van-der-Waals heterostructures have been recently studied as important components to realize digital electronics and multifunctional memory applications. Direct bandgap multilayer ReS 2 satisfies various requirements a… Show more

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Cited by 58 publications
(68 citation statements)
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“…Here, the Gr layer was found to be initially hole doped from the absorption of oxygen and/or water molecules from the air. [ 25 ] Typical I–V characteristics of fabricated diodes show that all the MIS‐type diodes exhibited a highly rectifying feature (Figure 2b). Room temperature output characteristics with different bias voltages are shown in Figure S1, Supporting Information, where electron accumulation and hole inversion in the ReS 2 layer are clearly observed.…”
Section: Resultsmentioning
confidence: 99%
See 3 more Smart Citations
“…Here, the Gr layer was found to be initially hole doped from the absorption of oxygen and/or water molecules from the air. [ 25 ] Typical I–V characteristics of fabricated diodes show that all the MIS‐type diodes exhibited a highly rectifying feature (Figure 2b). Room temperature output characteristics with different bias voltages are shown in Figure S1, Supporting Information, where electron accumulation and hole inversion in the ReS 2 layer are clearly observed.…”
Section: Resultsmentioning
confidence: 99%
“…The details of NVM operation with extended multilevel operation under laser excitation with a similar device structure have been reported elsewhere. [ 25 ] Here, we achieved NVM operation under a moderate electric field with a +/– 10 V gate bias, which can be further reduced if we use high quality h‐BN as the dielectric layer for the control gate ( p ++ Si) instead of using a SiO 2 dielectric layer. For an all 2D‐material‐based NVM device with low gate bias operation, the FG‐Gr can be isolated by both a top h‐BN (≈6–10 nm thick) and a bottom h‐BN (≈30–40 nm thick) subsequently insulated with another bottom Gr as a control gate electrode.…”
Section: Resultsmentioning
confidence: 99%
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“…With the behavior of operation at zero bias voltage and the excellent photo response, sc‐SiF‐based devices can be applied in self‐powered electronics and digital electronics. [ 59–61 ] These devices also show great potential for integrated optoelectronic applications. Multi‐band photodetecting systems were successfully achieved by integrating sc‐SiF‐based TFPDs with commercial IR or UV photodetectors.…”
Section: Discussionmentioning
confidence: 99%