Laser Induced Nanoablation of Diamond Materials

UV laser induced changes to morphological, optical and electrical properties of conductive nanocrystalline diamond films

“…The depth of the crater is only about 30 nm, which is less than the 150 nm film thickness. This is a new example of pulsed laser induced surface oxidation (nanoablation), which was earlier observed for non-conductive diamond samples [13,14]. The average etching rate is only 0.03 nm/pulse, which allows application of a nanoablation process M A N U S C R I P T ACCEPTED MANUSCRIPT 8 for ultra-precise film nanostructuring.…”

“…5 range employed in our experiments was varied from 0.05 through 5 J/cm 2 , and the ablation rate was observed to decrease by more than 2 orders of magnitude at a fluence of E≈E g ≈0.3 J/cm 2 , which is typical for this change of the mechanism of the diamond film ablation [14]. High-rate ablation is resulted from evaporation of graphitized surface layer, and low-rate etching (nanoablation) is characterized by laser-induced oxidation of initial material.…”

“…However, this approach is less developed but under intensive study for diamond films [11,12]. For example, recently it has been demonstrated that laser nanoablation is an effective technique for ultra precise removal of single, poly and nanocrystalline (all non-conductive) diamond samples, which are irradiated in air [13,14]. In this work, we present a new technique for laser induced nanostructuring of CNCD films which manifests itself at laser pulse intensities below the laser nanoablation threshold.…”

Deposition and Patterning of Polycrystalline Diamond Films Using Traditional Photolithography and Reactive Ion Etching

“…The difference lies in the fact that the pattern is determined even before the growth of the diamond film, which eliminates the need to process the diamond coating itself. The use of laser coating treatment is limited to surface treatment (ablation) [9] and the cutting of finished devices and structures because high beam powers result in the low depth control of etching, and the combination with the heterogeneity of the structure in height and crystal orientation leads to a negative effect on the whole process.…”

Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology

“…Laser ablation of the film surface, which is the action by the laser pulse with a high energy on the surface. The disadvantages of this method are a high energy of a pulse and a low depth resolution, it causes a high heating and eliminating the sample curvature [6].…”