2003
DOI: 10.1117/12.486511
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Laser-induced shock wave removal of chemical-mechanical polishing slurries from silicon wafers

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“…Among various techniques to remove sub-100 nm particles from solid substrates, the laser shock cleaning (LSC) process based on laser-induced breakdown (LIB) of air and plasma formation has attracted substantial attention as the process demonstrated strong potential to remove nanoscale particles from silicon wafers [5][6][7][8]. Recently, removal of polystyrene (PS) particles as small as 10 nm in diameter was reported [8].…”
Section: Introductionmentioning
confidence: 99%
“…Among various techniques to remove sub-100 nm particles from solid substrates, the laser shock cleaning (LSC) process based on laser-induced breakdown (LIB) of air and plasma formation has attracted substantial attention as the process demonstrated strong potential to remove nanoscale particles from silicon wafers [5][6][7][8]. Recently, removal of polystyrene (PS) particles as small as 10 nm in diameter was reported [8].…”
Section: Introductionmentioning
confidence: 99%