Laser interference fabrication of large-area functional periodic structure surface

Abstract

Functional periodic structures have attracted significant interest due to their natural capabilities in regulating surface energy, surface effective refractive index, and diffraction. Several technologies are used for the fabrication of these functional structures. The laser interference technique in particular has received attention because of its simplicity, low cost, and high-efficiency fabrication of large-area, micro/nanometer-scale, and periodically patterned structures in air conditions. Here, we reviewed the work on laser interference fabrication of large-area functional periodic structures for antireflection, self-cleaning, and superhydrophobicity based on our past and current research. For the common cases, four-beam interference and multi-exposure of two-beam interference were emphasized for their setup, structure diversity, and various applications for antireflection, self-cleaning, and superhydrophobicity. The relations between multi-beam interference and multi-exposure of two-beam interference were compared theoretically and experimentally. Nanostructures as a template for growing nanocrystals were also shown to present future possible applications in surface chemical control. Perspectives on future directions and applications for laser interference were presented.

Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication

“…The sample can then be rotated and doubly exposed to achieve a two‐dimensional ARM pattern. [ 126,128,129 ]…”

“…Generally, the method allows for the formation of highly complex structures. [ 129 ] In refs. [126, 128], a frequency‐tripling, Q‐switched, single‐mode Nd:YAG laser (Spectra‐Physics) with an emission wavelength of 355 nm, a frequency of 10 Hz, and pulse duration of 10 ns was employed for ARM fabrication with multi‐exposure interference ablation process.…”

“…Although structures with a smaller period were also demonstrated, the scaling of the acpect ratio was not provided and only a rough estimate of the optimal morphology was given. [ 126,129 ] Thus, fine‐tuned or hierarchical morphology can be fabricated with this advanced method. Therefore, higher transmittance can be achieved in the mid‐IR range.…”

“…[ 51,127 ] Furthermore, the accuracy can be drastically increased by increasing the setup complexity, using controllable direct laser writing [ 29 ] or interference ablation. [ 129 ] Besides, these techniques enable the precise control of the cross‐section profile, which cannot be achieved with single‐pulse ablation. Another advantage of direct laser ablation techniques is that most of them can be adopted for the treatment of non‐flat surfaces.…”

Nanohole array plasmonic biosensors: Emerging point-of-care applications

“…Interference lithography (IL) allows fabrication of large area NHAs without requiring any photomasks or advanced objective lens systems(C. and R.H. 2010; Wang et al 2018a). Two or more coherent lights incident from varied directions form interference patterns in a photoresist layer.…”