Laser produced EUV light source development for HVM

Endo, Akira; Hoshino, Hideo; Suganuma, Takashi; Moriya, Masato; Ariga, Tatsuya; Ueno, Yoshifumi; Nakano, Masaki; Asayama, Takeshi; Abe, Tamotsu; Komori, Hiroshi; Soumagne, Georg; Mizoguchi, Hideaki; Sumitani, Akira; Toyoda, K.

doi:10.1117/12.711097

Cited by 26 publications

(12 citation statements)

References 8 publications

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“…16 Experiments were conducted with Nd:YAG laser generated Sn plate target plasma in the presence and absence of 1 T magnetic field and results showed that the FC signal decreased below the detection limit (about 3 orders) in the presence of magnetic field. 37 It was reported that for Nd:YAG LPP, the ions only weakly influence the deposition. 37 From the experimental results, it is estimated that the ion effect on deposition is below 1%.…”

Section: B Fc Ion Analysismentioning

confidence: 99%

“…37 It was reported that for Nd:YAG LPP, the ions only weakly influence the deposition. 37 From the experimental results, it is estimated that the ion effect on deposition is below 1%. In case of a Nd:YAG drive laser and a Sn target, debris mitigation is therefore much more important than ion mitigation.…”

Section: B Fc Ion Analysismentioning

confidence: 99%

“…In case of a Nd:YAG drive laser and a Sn target, debris mitigation is therefore much more important than ion mitigation. 37 The ion time-of-flight (TOF) profiles are represented by a sharp prompt peak, followed by a broad slower peak. 12 The fast prompt peak in the ion signal is caused by the photoelectric effect and can be used as a time marker.…”

Section: B Fc Ion Analysismentioning

confidence: 99%

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Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

et al. 2014

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We investigated the role of a guiding magnetic field on extreme ultraviolet (EUV) and ion emission from a laser produced Sn plasma for various laser pulse duration and intensity. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm, Nd:YAG laser pulses with varying pulse duration (5–15 ns) and intensity. A magnetic trap was fabricated with the use of two neodymium permanent magnets which provided a magnetic field strength ∼0.5 T along the plume expansion direction. Our results indicate that the EUV conversion efficiency do not depend significantly on applied axial magnetic field. Faraday Cup ion analysis of Sn plasma show that the ion flux reduces by a factor of ∼5 with the application of an axial magnetic field. It was found that the plasma plume expand in the lateral direction with peak velocity measured to be ∼1.2 cm/μs and reduced to ∼0.75 cm/μs with the application of an axial magnetic field. The plume expansion features recorded using fast photography in the presence and absence of 0.5 T axial magnetic field are simulated using particle-in-cell code. Our simulation results qualitatively predict the plasma behavior.

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Section: B Fc Ion Analysismentioning

confidence: 99%

Section: B Fc Ion Analysismentioning

confidence: 99%

Section: B Fc Ion Analysismentioning

confidence: 99%

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Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

et al. 2014

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“…Since 2002 we have developed CO 2 laser produced Tin plasma EUV source (CO 2 -Sn-LPP) which is the most promising solution as the 13.5nm high power (> 200W) light source for high volume production extreme ultraviolet lithography (EUVL) 5) . Because of its high efficiency, scalability and spatial freedom from plasma, we believe the CO 2 -Sn-LPP scheme is most promising candidate.…”

Section: Introductionmentioning

confidence: 99%

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Mizoguchi¹,

Abe

Watanabe

et al. 2011

SPIE Proceedings

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We reported 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography one year ago 1) . In this paper we update performance status of the 1st generation system. We have improved the system further, maximum burst power is 104W (100kHz, 1 mJ EUV power @ intermediate focus), laser-EUV conversion efficiency is 2.5%. Also continuous operation time is so far up to 8 hours with 5% duty cycle is achieved. We have investigated EUV plasma creation scheme by small experimental device which is facilitated 10Hz operation (maximum). We have proposed double pulse method to create LPP plasma efficiently. This moment we found out 3.3% conversion efficiency operation condition.Based on the engineering data of ETS and small experimental device, now we are developing 2 nd generation HVM source; GL200E. The device consists of the original concepts (1) CO 2 laser driven Sn plasma, (2) Hybrid CO 2 laser system that is combination of high speed (>100kHz) short pulse oscillator and industrial cw-CO 2 , (3) Magnetic mitigation, and (4) Double pulse EUV plasma creation. The preliminary data are introduced in this paper.

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“…The laser power of the order of kW needed for industrial EUV lithography will result in greater target-particle production compared to that used in our experiment (laser power ∼10 W). The most successful scheme of the EUV source approaching the required intermediate focus point power of 115 W has turned out to be the combination of a tin droplet target (kind of mass-limited) irradiated with a CO 2 laser using the prepulse technique [49,50]. This also minimizes the debris problem.…”

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confidence: 99%

Laser-produced plasma EUV source based on tin-rich, thin-layer targets

et al. 2010

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In this paper a new approach to a laser-produced plasma EUV source based on a tin target is presented. A thin layer of pure tin and composite layers consisting of Sn with Si, SiO and LiF are investigated. The target composed of several thin layers produces less debris than the other targets and provides a conversion efficiency (CE) in the 13.5-nm ± 1% band at least comparable to the CE for the pure tin slab target. The largest CE was observed for the target composed of a mixture of Sn and LiF, due to the fact that lithium, similarly to tin, is a strong emitter at 13.5 nm.

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Laser produced EUV light source development for HVM

Cited by 26 publications

References 8 publications

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Laser-produced plasma EUV source based on tin-rich, thin-layer targets

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