Laser-Produced Plasma Light Source Development for Extreme Ultraviolet Lithography

Komori, Hiroshi; Soumagne, Georg; Abe, Tamotsu; Suganuma, Takashi; Imai, Yousuke; Someya, Hiroshi; Takabayashi, Y.; Endo, Akira; Toyoda, K.

doi:10.1143/jjap.43.3707

Cited by 14 publications

(5 citation statements)

References 16 publications

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“…We analyzed the kinetic energy distribution of suprathermal ions with different charged states using an electrostatic analyzer ͑ESA͒ coupled to a microchannel plate. 13,14 The kinetic energy distribution of the suprathermal ions was determined by the time-of-flight signal of the ESA. The ESA was orientated at an angle of 45°with respect to the incident direction of the laser pulses.…”

mentioning

confidence: 99%

Suppression of suprathermal ions from a colloidal microjet target containing SnO2 nanoparticles by using double laser pulses

Higashiguchi¹,

Kaku

Katto

et al. 2007

Applied Physics Letters

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We have demonstrated suppression of suprathermal ions from a colloidal microjet target plasma containing tin-dioxide (SnO2) nanoparticles irradiated by double laser pulses. We observed a significant decrease of the tin and oxygen ion signals in the charged-state-separated energy spectra when double laser pulses were irradiated. The peak energy of the singly ionized tin ions decreased from 9to3keV when a preplasma was produced. The decrease in the ion energy, considered as debris suppression, is attributed to the interaction between an expanding low-density preplasma and a main laser pulse.

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mentioning

confidence: 99%

Suppression of suprathermal ions from a colloidal microjet target containing SnO2 nanoparticles by using double laser pulses

Higashiguchi¹,

Kaku

Katto

et al. 2007

Applied Physics Letters

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“…In various plasma ions, the main charge states were observed to be single or double. [20][21][22][23] Although highly charged ions emit X-rays, their charge states are reduced through recombination in expanding and cooling plasma. The calculated ion number is inversely proportional to the charge state in Eq.…”

Section: Plasma Ions 41 Ar Ion Characteristicsmentioning

confidence: 99%

Water-window soft X-ray source using cryogenic Ar laser plasma

Amano

2018

Jpn. J. Appl. Phys.

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A water-window soft X-ray source using laser plasma from a cryogenic solid Ar target has demonstrated an average output power of 0.5 W with continuously repeated pulses at 3.3 Hz. A higher output power of up to 1 W at 10 Hz can be achieved by simply improving the target system. The characteristics of the Ar ion debris from the plasma were also studied and the kinetic energies of the main ions were found to be less than 2 keV. Using the measured ion spectrum, the erosion damage sputtered by Ar ions on the silicon nitride membrane was studied and the results indicated that the damage should cause no problems in the application of a contact soft X-ray microscope. Our laser plasma X-ray source will provide a compact and convenient source suitable for the soft X-ray microscopy in place of conventional synchrotron facilities.

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“…LPP liquid jet targets and droplet targets are mainly utilized for high repetition rate operation and low debris emissions due to their respective regenerative and quasi-mass limited natures [3]. Laser-produced tin plasmas have a significant potential for achieving a high conversion efficiency at 13.5 nm [4,5].…”

Section: Introductionmentioning

confidence: 99%

EUV and debris characteristics of a laser-plasma tin dioxide nano-particle colloidal jet target

et al. 2008

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Debris characteristics and its reduction have been investigated for a laser-produced plasma (LPP) extreme ultraviolet (EUV) source using a colloidal jet target containing tin dioxide nano-particles. Dominant deposited debris on a witness plate was found to have a form of oxidized tin (SnO x ) originated from nano-particles. Quantitative debris amounts were determined by total laser energy irradiated onto a target, not by laser irradiation modes, such as single or double pulse irradiation. In-situ low-temperature (100 °C) heating of a plate was effective to reduce the deposited debris amount, since colloidal debris was easily vaporized by the heat. Another approach to remove the deposited debris was roomtemperature photon processing using incoherent vacuum ultraviolet (VUV) emission at 126 nm. X-ray photoelectron spectroscopy (XPS) analysis has shown that the deposited SnO x debris layer was deoxidized by the 126 nm VUV photon energy.

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Laser-Produced Plasma Light Source Development for Extreme Ultraviolet Lithography

Cited by 14 publications

References 16 publications

Suppression of suprathermal ions from a colloidal microjet target containing SnO2 nanoparticles by using double laser pulses

Suppression of suprathermal ions from a colloidal microjet target containing SnO2 nanoparticles by using double laser pulses

Water-window soft X-ray source using cryogenic Ar laser plasma

EUV and debris characteristics of a laser-plasma tin dioxide nano-particle colloidal jet target

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