2018
DOI: 10.1016/j.carbon.2017.11.034
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Lateral heterostructures of two-dimensional materials by electron-beam induced stitching

Abstract: We present a novel methodology to synthesize two-dimensional (2D) lateral heterostructures of graphene and MoS2 sheets with molecular carbon nanomembranes (CNMs), which is based on electron beam induced stitching. Monolayers of graphene and MoS2 were grown by chemical vapor deposition (CVD) on copper and SiO2 substrates, respectively, transferred onto gold/mica substrates and patterned by electron beam lithography or photolithography. Self-assembled monolayers (SAMs) of aromatic thiols were grown on the gold f… Show more

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Cited by 24 publications
(18 citation statements)
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“…Numerous techniques for patterning of 2D materials have been recognized in the past decades [14][15][16]22,43]. It has just begun to apply a photolithography technique, electron beam lithography, and scanning probe technique for patterning 2D films [44][45][46][47]. Shortly the market for 2D materials is expected to compete with the reliability of silicon-based electronic sensor because of possibility of designing in micro and nanoscale.…”
Section: Dimensions (2d) Materialsmentioning
confidence: 99%
“…Numerous techniques for patterning of 2D materials have been recognized in the past decades [14][15][16]22,43]. It has just begun to apply a photolithography technique, electron beam lithography, and scanning probe technique for patterning 2D films [44][45][46][47]. Shortly the market for 2D materials is expected to compete with the reliability of silicon-based electronic sensor because of possibility of designing in micro and nanoscale.…”
Section: Dimensions (2d) Materialsmentioning
confidence: 99%
“…The transfer procedure was conducted as described elsewhere. 31 A PMMA layer (100 nm, 50 kDa, All-Resist, AR-P 671.04) was spin coated onto the CNM on gold/mica and hardened for 10 min at 90°C. Subsequently, a thicker layer of PMMA (200 nm, 950 kDa, All-Resist, AR-P 679.04) was spin coated on top of the first one and hardened for 10 min at 90°C.…”
Section: Transfer Of the Cnms Onto Sin/sio 2 Chipsmentioning
confidence: 99%
“…[5,7,19] New properties and applications arise from the creation of van der Waals heterostructures of layered compounds. [43,44] _ENREF_44…”
Section: Introductionmentioning
confidence: 99%