We fabricate BaSi 2 epitaxial films on Si(111) substrates by molecular beam epitaxy and investigate point defects inside the films using Raman spectroscopy with the help of first-principles calculation. Point defects such as Ba substituted for Si antisites, Si vacancies, and Si interstitials are considered as candidates for native point defects in BaSi 2. Vibration analysis based on firstprinciples calculation suggests that local vibrational modes caused by these point defects appear at around 430, 480, and 560 cm À1 , respectively, and are in good agreement with Raman peak positions. Comparing calculations with Raman spectra of the films formed with different Ba to Si deposition rate ratios R Ba /R Si from 1.0 to 5.1, we conclude that the density of point defects reaches a minimum at R Ba /R Si ¼ 2.2. Furthermore, the position of Raman peaks at approximately 490 cm À1 shifts to a lower wavenumber, depending on R Ba /R Si and thereby the density of point defects.