Optical Measurement of Surface Topography 2011
DOI: 10.1007/978-3-642-12012-1_12
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Light Scattering Methods

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Cited by 12 publications
(8 citation statements)
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“…The X-ray CT technique is less influenced by the complexity of the geometrical design and offers a nondestructive visualization of the internal features [19]. Furthermore, the X-ray CT technique does not suffer from the inability to detect steep slopes and undercuts as the standard optical methods [20]. Other areas where X-ray CT are applied for engineering purposes are within the characterization of agglomerates of primary particles [21,22].…”
Section: Characterization Of Surface Texturementioning
confidence: 99%
“…The X-ray CT technique is less influenced by the complexity of the geometrical design and offers a nondestructive visualization of the internal features [19]. Furthermore, the X-ray CT technique does not suffer from the inability to detect steep slopes and undercuts as the standard optical methods [20]. Other areas where X-ray CT are applied for engineering purposes are within the characterization of agglomerates of primary particles [21,22].…”
Section: Characterization Of Surface Texturementioning
confidence: 99%
“…A brief description of the general characteristics of the methods, those most frequently utilised during in-process inspection, was discussed in Section 2. The authors decided to focus on a group of optical methods based on light scattering phenomenon widely disseminated in works by Babu Rao and Raj [8], Łukianowicz [9] and Vorburger et al [10]. Due to the number of advantageous metrological properties this group of optical methods possess they are widely used in in-process inspections.…”
Section: Page 4 Of 27mentioning
confidence: 99%
“…Atomic force microscopy (AFM) [5] and scanning tunnelling microscope (STM) [6] has been demonstrated for on-machine measurement of micro-structured surfaces, but besides the low scanning speed, AFM and STM are limited by a compromise between range and resolution [7]. Light scattering techniques such as scatterometry are used for in-process surface measurement as they can infer surface information from scattering patterns [8], and they have the advantages of being non-contact, high speed and low-cost. Scatterometry has been widely used for the measurement of critical dimension in semiconductor chips [9] and measurement of surface roughness [10].…”
Section: Introductionmentioning
confidence: 99%