Line defects in two-dimensional four-beam interference patterns

Two‐ and Three‐Dimensional Micro‐ and Sub‐Micrometer Periodic Structures Using Two‐Beam Laser Interference Lithography

“…On the contrary, for an asymmetric configuration which is not satisfied by the conditions previously mentioned, periodic or quasi periodic linear defects appear in the pattern. [19] This effect is shown in Figure 3b for the condition…”

“…[19] In consequence, for a proper defect-free periodic structure fabrication using a four laser beam setup, a perfect control of the initial phase, azimuthal angles as well as a perfect positioning of the sample at the plane z ¼ 0 is necessary. In contrast, we have seen that when using two laser beams only a change of the pattern offset is observed when varying the initial phase, remaining both shape and intensity of the pattern unchanged.…”

“…[14,16,17] On the other hand, fabrication of 3D structures requires more than three coherent laser beams, [15,18] but increasing the complexity of the experimental setup also increases the possibility of introducing defects in the periodic structure. [19] In this study, we present different approaches for the fabrication of two and three dimensional structures using two-beam interference lithography, and thus avoiding the introduction of defects. Firstly, we present a model for the calculation of interference patterns for N laser beams describing the effects of individual beam phase and incident angles on line defects in the intensity distribution, as well as a double exposure model.…”

Effects of polarization on four-beam laser interference lithography

“…Among them, four-beam laser interference lithography is the most extensively investigated technology. 16,[25][26][27][28][29][30][31][32][33][34] Theoretically, four-beam laser interference could generate evenly distributed periodic structure patterns, but in practice, noticeable modulations were almost unavoidably introduced in interference patterns due to the misalignment of incident angles or unequal incident angles, 25,31-33 which is not desired for many applications.…”

Error factors affecting the result of Laser Interference Lithography

“…It will influence not only on the contrast of pattern, bus also on the period of micro structure, direction of array arrangement, shapes of dots or holes [15][16][17][18]. The ideal situation is that all of the polarized components have the same vibration direction when they finally are combined on the sample surface.…”